NASA NTRS · 19720000645
Dual field alignment display and control for electron micropattern generator
Abstract
Application of electron beam lithography to replace photolithography process in fabrication of integrated circuits is discussed. Procedure for using electron beam lithography equipment is described. Diagram of electron micropattern generator is provided.
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Malmberg, P. R., Okeeffe, T. W.. 1972-10-01. Dual field alignment display and control for electron micropattern generator. https://ntrs.nasa.gov/citations/19720000645
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