Engineering topics
Publications and source records attributed to Malmberg, P. R..
Application of electron beam lithography to replace photolithography process in fabrication of integrated circuits is discussed. Procedure for using electron beam lithography equipment is described. Diagram of electron micropattern generator is provided.
Development of dual speed deflection system for electron beam micropattern generator system is discussed. Factors affecting application of electron beam lithography are analyzed. Procedure for using two speed deflection system is described.
Development of flexible selected interconnection technique for monolithic circuits
Collisional excitation in Van de Graaff accelerator of beams of light elements producing light emission in 2700-6600 angstrom range
Ionization charge stage for spectral lines determined by sending particle beam through field which separates components of different net charge