NASA NTRS · 19720000667
Two-speed deflection system for electron micropattern generator
Abstract
Development of dual speed deflection system for electron beam micropattern generator system is discussed. Factors affecting application of electron beam lithography are analyzed. Procedure for using two speed deflection system is described.
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Malmberg, P. R.. 1972-10-01. Two-speed deflection system for electron micropattern generator. https://ntrs.nasa.gov/citations/19720000667
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