NASA NTRS · 19740022097
Thick film silicon growth techniques
Abstract
One inch wide silicon ribbons up to 14 inches long have been produced from graphite dies. Several different techniques have been employed to improve the semiconductor purity of silicon. This has resulted in a general increase in quality although the techniques involved have not been optimized. The power factor of uncoated ribbon solar cells produced for material evaluation has increased to approximately 75% of those evaluation cells made from commercial silicon. The present limitation is believed due to low lifetime. Additional work has continued with new die materials; however, only composite dies of SiO2 and C show significant potential at this time.
Keep this discovery
Explore connections, maps & timelines
Bates, H. E., Jewett, D. N., Mlavsky, A. I., White, V. E.. 1974-02-28. Thick film silicon growth techniques. https://ntrs.nasa.gov/citations/19740022097
Cite the original work for its findings. Save a collection to share your selection of sources.