NASA NTRS · 19750000178
Improved multiple-target sputtering equipment
Abstract
Sputtering chamber has been developed with multiple target. Several film layers can be deposited without repeated evacuation and refilling. Contamination through exposure to air is eliminated.
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Shima, R.. 1975-08-01. Improved multiple-target sputtering equipment. https://ntrs.nasa.gov/citations/19750000178
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