NASA NTRS · 19750041613
Studies on the Al2O3-Ti-Mo-Au metallization system
Abstract
The behavior of Ti-Mo-Au metallization on Al2O3 and C has been investigated by backscattering spectrometry. Results show that Mo-Au bimetal films typically mix during deposition. Diffusion of Ti in Mo film occurs at 600 C, but is inhibited by the presence of oxygen in the Ti film. Even 1000 A of Mo is not a barrier against interdiffusion of Ti and Au during 20-min anneals at 600 C. The amount of mixing observed also depends on the nature of the substrate which supports the Ti-Mo-Au metallization.
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Harris, J. M., Lugujjo, E., Nicolet, M.-A., Campisano, S. U., Shima, R.. 1975-02-01. Studies on the Al2O3-Ti-Mo-Au metallization system. https://ntrs.nasa.gov/citations/19750041613
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