X-ray reflection and scatter measurements on selected optical samples

Abstract

The results from an experimental program to determine the reflection efficiency and scatter parameters of selected optical samples are presented. The measurements were made using 8.34A X-rays at various angles of incidence. Selected samples were contaminated after being measured and then remeasured to determine the effects of contamination. The instrumentation involved in taking the data, including the X-ray reflectometer and data processing equipment, is discussed in detail. The condition of the optical surfaces, the total reflection measurements, the scatter measurements, and the analysis are discussed.