NASA NTRS · 19790024293
Silicon-gate CMOS/SOS processing
Abstract
Major silicon-gate CMOS/SOS processes are described. Sapphire substrate preparation is also discussed, as well as the following process variations: (1) the double epi process; and (2) ion implantation.
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Ramondetta, P.. 1979-03-01. Silicon-gate CMOS/SOS processing. https://ntrs.nasa.gov/citations/19790024293
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