X-ray reflectometer for optical efficiency and scatter measurements

Abstract

An instrument has been developed to determine the reflection efficiency and scatter characteristics of optical samples at X-ray wavelengths from 1.5 to 113 A. The reflectometer operates in an oil-free vacuum chamber and measures the reflection efficiency and scatter characteristics as a function of the angle of incidence. The reflection efficiency is given for 8.34-A radiation incident on a fused silica sample finished to a flatness of one-tenth of a wavelength. The experimental reflection efficiency is compared with the theoretical data. The scatter curves are given for the direct X-ray beam and for the beam reflected from the fused silica sample at an angle of incidence of 50 arcmin. The full-width-at-half-maximum (FWHM) resolution of the instrument is approximately 13 arcsec, as determined by a least-squares smoothing of the experimental data.