NASA NTRS · 19910000358
Five-Segment Interconnection For Electromigration Tests
Abstract
Proposed integrated-circuit conductive pattern intended for use in electromigration lifetime testing of interconnection lines of integrated circuits. Designed for collection of statistics on electromigration from smallest possible area. Includes 5 interconnection segments with Kelvin voltage taps, with total of 12 contact pads, and provides for simultaneous measurements on all of segments. Attempts to minimize thermal gradients within each segment and conforms to guidelines on electromigration test structures promulgated by National Institute of Standards and Technology (NIST).
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Hannaman, David J., Buehler, Martin G.. 1991-08-01. Five-Segment Interconnection For Electromigration Tests. https://ntrs.nasa.gov/citations/19910000358
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