NASA NTRS · 19910034605
Space vacuum processing
Abstract
The unique ultra-vacuum environment of low-earth orbit space is to be utilized for vacuum processing of advanced semiconductor and superconductor materials through epitaxial thin-film growth. The quality of semiconductor single crystal (epitaxial) thin-films can be significantly enhanced in the space ultra-vacuum through the reduction of impurities. This will be accomplished by the development of the free-flying Wake Shield Facility presently being built by the Space Vacuum Epitaxy Center in conjunction with industry and NASA under a low-cost, short time commercial approach to space hardware development.
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Ignatiev, A., Shih, H. D., Daniels, M., Sega, R., Bonner, T.. 1991-01-01. Space vacuum processing. https://ntrs.nasa.gov/citations/19910034605
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