Variable sensitivity moire interferometry

Abstract

This paper demonstrates that optical microlithography can be used to produce a crossed grating which diffracts light into multiple orders sufficient to record moire interferograms with sensitivities ranging from 2.0 to 0.285 micron/fringe. The grating profile produced by the method is analyzed to establish the diffraction efficiency in each diffraction order, and generalized expressions are given for variable sensitivity moire interferometry. Experimental tests are conducted to verify analytical arguments. In one of these tests, two different diffraction order pairs are used simultaneously to verify that surface displacement can be measured at different sensitivities.