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NASA NTRS · 19950065202

Safety-Enclosure System For MOCVD Process Chamber

Abstract

Safety-enclosure system filled with nitrogen surrounds reaction chamber in which metallo-organic chemical vapor deposition (MOCVD) performed. Designed to protect against explosions and/or escaping toxic gases and particulates. Gas-purification subsystem ensures during loading and unloading of process materials, interior of MOCVD chamber exposed to less than 1 ppm of oxygen and less than 5 ppm of water in nitrogen atmosphere. Toxic byproducts of MOCVD process collected within inert atmosphere. Enclosure strong enough to contain any fragments in unlikely event of explosion.

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BibTeXRIS

Singletery, James, Jr., Velasquez, Hugo, Warner, Joseph. 1995-01-01. Safety-Enclosure System For MOCVD Process Chamber. https://ntrs.nasa.gov/citations/19950065202

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