Processing Choices for Achieving Long Term IC Operation at 500° C

Abstract

The prospects for beneficial infusion of integrated circuits (ICs) into previously inaccessible extreme-temperature application environments has increased with recent NASA Glenn demonstrations of 4H-SiC Junction Field Effect Transistor & Resistor (JFET-R) chips functioning for over a year at 500 °C in air ambient [1]. This paper focuses on fabrication process choices believed key to demonstrated 500 °C durability that must be considered when porting this uniquely durable IC capability into commercial foundry manufacturing.