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DOE OSTI · 1642683

Electron quantum interference in epitaxial antiferromagnetic NiO thin films

Xu, Jia·Lou, Feng·Jia, Mengwen·Chen, Gong·Zhou, Chao·Li, Qian·Liu, Kai·Schmid, Andreas K.·Xiang, Hongjun·Wu, Yizheng
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Abstract

The electron reflectivity from NiO thin films grown on Ag(001) has been systematically studied as a function of film thickness and electron energy. A strong electron quantum interference effect was observed from the NiO film, which is used to derive the unoccupied band dispersion above the Fermi surface along the Γ-X direction using the phase accumulation model. The experimental bands agree well with first-principles calculations. A weaker electron quantum interference effect was also observed from the CoO film.

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36 MATERIALS SCIENCE

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Xu, Jia, Lou, Feng, Jia, Mengwen, Chen, Gong, Zhou, Chao, Li, Qian, Liu, Kai, Schmid, Andreas K., Xiang, Hongjun, Wu, Yizheng. 2020-04-03. Electron quantum interference in epitaxial antiferromagnetic NiO thin films. https://doi.org/10.1063/1.5129772

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36 MATERIALS SCIENCE↗