Material mixing during fuzz formation in W and Mo

Abstract

Helium-induced fuzz formation in tungsten (W) and molybdenum (Mo) is investigated for a range of sample exposure temperatures from 838 K–1075 K (He fluence = 3.4 × 10 25 m -2 and ion energy <39 eV). Thin films of Mo deposited on W substrates show mixing of the film and substrate materials in the fuzz after He plasma exposure, including at 838 K (i.e. below the typical temperature range at which fuzz forms in pure W). Finally, the amount of material mixing increases with exposure temperature due to the increase in bubble size, and leads to significant accumulation of the substrate material at the fuzz surface at the highest temperature investigated, further supporting fuzz growth from the fiber tip outwards by material transport up the fibers.