DOE OSTI · 1892917
ALD reactor for coating porous substrates
Abstract
A system and method for improved atomic layer deposition. The system includes a top showerhead plate, a substrate and a bottom showerhead plate. The substrate includes a porous microchannel plate and a substrate holder is positioned in the system to insure flow-through of the gas precursor.
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Mane, Anil U., Libera, Joseph, Elam, Jeffrey W.. 2022-05-10. ALD reactor for coating porous substrates. https://www.osti.gov/biblio/1892917
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