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DOE OSTI · 1992856

Gate-Tunable Multiband Transport in ZrTe 5 Thin Devices

Abstract

Interest in ZrTe 5 has been reinvigorated in recent years owing to its potential for hosting versatile topological electronic states and intriguing experimental discoveries. However, the mechanism of many of its unusual transport behaviors remains controversial: for example, the characteristic peak in the temperature-dependent resistivity and the anomalous Hall effect. Here, through employing a clean dry-transfer fabrication method in an inert environment, we successfully obtain high-quality ZrTe 5 thin devices that exhibit clear dual-gate tunability and ambipolar field effects. Such devices allow us to systematically study the resistance peak as well as the Hall effect at various doping densities and temperatures, revealing the contribution from electron–hole asymmetry and multiple-carrier transport. By comparing with theoretical calculations, we suggest a simplified semiclassical two-band model to explain the experimental observations. Finally, our work helps to resolve the longstanding puzzles on ZrTe 5 and could potentially pave the way for realizing novel topological states in the two-dimensional limit.

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BibTeXRIS

Liu, Yonghe, Pi, Hanqi, Watanabe, Kenji, Taniguchi, Takashi, Gu, Genda, Li, Qiang, Weng, Hongming, Wu, Quansheng, Li, Yongqing, Xu, Yang. 2023-05-19. Gate-Tunable Multiband Transport in ZrTe 5 Thin Devices. https://doi.org/10.1021/acs.nanolett.3c01528

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