DOE OSTI · 2325561
Tuning the work function of nickel oxide using triethoxysilane functionalized monolayers
Abstract
We have synthesized a family of styryl-based molecules that have been attached to nickel oxide films using a novel ethoxysilane chemistry to modify the work function over a range of 900 meV.
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Chen, Gang, Wang, Xinquan, Shi, Yuting, Tinkham, Jonathan S., Brenner, Thomas M., Olson, Dana C., Sellinger, Alan, Furtak, Thomas E.. 2021-01-28. Tuning the work function of nickel oxide using triethoxysilane functionalized monolayers. https://doi.org/10.1039/d0cp03306e
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