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DOE OSTI · 2496686

Plasma sources for advanced semiconductor applications

Versolato, Oscar [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)] (ORCID:0000000171226283)·Kaganovich, Igor [Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)] (ORCID:0000000306535682)·Bera, Kallol [Applied Materials, Inc., Santa Clara, CA (United States)] (ORCID:0000000299488098)·Lill, Thorsten [Lam Research Corporation, Fremont, CA (United States)] (ORCID:0000000186685247)·Lee, Hyo-Chang [Korea Aerospace University, Goyang (Korea, Republic of)] (ORCID:0000000327541512)·Hoekstra, Ronnie [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Univ. of Groningen (Netherlands)] (ORCID:0000000186323334)·Sheil, John [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)] (ORCID:0000000333939658)·Nam, Sang Ki [Samsung Electronics Corp. (Korea, Republic of)] (ORCID:0000000230382922)
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Abstract

Semiconductors are the foundation of modern technology, used in our personal, industrial, and military-grade devices. Further, every aspect of U.S. society is closely tied to semiconductors, and our economy cannot progress at the current pace with existing chip manufacturing methods as chip features approach an atomistic scale.

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70 PLASMA PHYSICS AND FUSION TECHNOLOGYInductively coupled plasmaLaser induced fluorescenceMicroelectronicsPlasma diagnosticsPlasma dischargesPlasma processingPlasma productionPlasma properties and parametersPlasma sourcesSemiconductors

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Versolato, Oscar [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)] (ORCID:0000000171226283), Kaganovich, Igor [Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)] (ORCID:0000000306535682), Bera, Kallol [Applied Materials, Inc., Santa Clara, CA (United States)] (ORCID:0000000299488098), Lill, Thorsten [Lam Research Corporation, Fremont, CA (United States)] (ORCID:0000000186685247), Lee, Hyo-Chang [Korea Aerospace University, Goyang (Korea, Republic of)] (ORCID:0000000327541512), Hoekstra, Ronnie [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Univ. of Groningen (Netherlands)] (ORCID:0000000186323334), Sheil, John [Advanced Research Center for Nanolithography, Amsterdam (Netherlands); Vrije Univ., Amsterdam (Netherlands)] (ORCID:0000000333939658), Nam, Sang Ki [Samsung Electronics Corp. (Korea, Republic of)] (ORCID:0000000230382922). 2024-12-05. Plasma sources for advanced semiconductor applications. https://doi.org/10.1063/5.0247819

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