DOE OSTI · 2541722
Acoustics-based noninvasive wafer defect detection
Abstract
Techniques are provided for detecting wafer defects. Example techniques include exciting a wafer using an acoustic signal to cause the wafer to exhibit vibrations, measuring one or more of linear frequency response metrics or nonlinear frequency responses metrics associated with the vibrations, and identifying any defects in the wafer based at least in part on one or more of the linear frequency response metrics or nonlinear frequency responses metrics. In embodiments, the wafer includes bismuth telluride (Bi 2 Te 3 ).
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Pantea, Cristian, Greenhall, John James, Graham, Alan Lyman, Sinha, Dipen N.. 2024-01-23. Acoustics-based noninvasive wafer defect detection. https://www.osti.gov/biblio/2541722
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