DOE OSTI · 3010738
Measuring the flatband potential in 2D semiconductors: Pitfalls and a possible SECCM solution
Abstract
The flatband potential (V fb ) is a critical parameter in semiconductor electrochemistry, defining the potential at which no excess charge exists at the semiconductor/electrolyte interface. It serves as a key reference for interpreting charge transfer kinetics and current–voltage behavior. However, conventional methods like Mott–Schottky analysis fail for atomically thin 2D materials due to the breakdown of the depletion approximation. This perspective examines the limitations of traditional V fb measurements for 2D semiconductors and the experimental challenges that arise. To address these issues, we propose using scanning electrochemical cell microscopy (SECCM) to spatially resolve the potential of zero charge (V pzc ), equivalent to V fb . This approach mitigates sample heterogeneity issues, such as pinholes or multilayer defects, and offers a pathway to more accurate electrochemical characterization. Ultimately, this method will enhance understanding of current–potential behavior in 2D materials, supporting the design of advanced systems for photoelectrocatalysis, energy conversion, and sensing.
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Chard, Ava R. [Colorado State University, Fort Collins, CO (United States)], Sambur, Justin B. [Colorado State University, Fort Collins, CO (United States)] (ORCID:0000000284574946). 2025-05-19. Measuring the flatband potential in 2D semiconductors: Pitfalls and a possible SECCM solution. https://doi.org/10.1016/j.coelec.2025.101703
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