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DOE OSTI · 3017593

A dual dynamic shutter system for accelerating ion irradiation sample throughput via lateral gas implantation gradients

Abstract

Ion irradiation for material performance testing is limited due to its serial nature, which allows for only one value of the implantation (appm) versus dose (dpa) parameter space to be explored for each ion and experiment at a time. While ion irradiation can accelerate the process by up to three orders of magnitude compared to neutron irradiation experiments, the sample throughput for ion irradiation remains relatively low. To address these limitations, a novel capability has been developed at the Michigan Ion Beam Laboratory (MIBL), enabling for the creation of single- and two-dimensional lateral ion implantation gradients using recently installed motorized-controlled ion-beam shutters. This advancement can generate a wide scope of the two-dimensional (H+, He2+) implantation parameter space within a single sample. Integration of this new capability now allows for dual- and triple-ion beam experiments to be performed with full user control over not only the ion implantation depth, but also laterally across the sample by imposing ion implantation concentration gradients, thus providing researchers with a high-throughput means for material testing under various irradiation conditions. Furthermore, recent improvements in MIBL's microbeam ion-beam analysis (IBA) target station now allow for probing these concentration gradients in irradiated alloys with exceptional spatial resolution, down to 10 µm. These two approaches promise to significantly improve ion irradiation capabilities and increase the sample throughput by several orders of magnitude. The application of the shutter technique plus the subsequent microbeam characterization of the imposed implantation gradients are showcased by two proof-of-principle ion-irradiated experiments, one performed on single-crystal Si and the other on the fusion-candidate alloy F82H-IEA. These advancements mark a substantial leap in ion-beam technology, offering researchers a robust, high-throughput method to efficiently investigate candidate alloys with high technological readiness for both advanced fission and fusion reactor applications, in a time- and cost-effective manner.

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BibTeXRIS

Penders, A.G. (ORCID:0000000215886532), Hirst, C.A. (ORCID:0000000329739290), Zhang, Z., Clowers, L.N., Pauly, V. (ORCID:0000000310346139), Flick, A., Naab, F., Garrison, L.M., Dennett, C.A. (ORCID:0000000329899550), Short, M.P. (ORCID:0000000292162482), Was, G.S. (ORCID:0000000322130845). 2026-02-01. A dual dynamic shutter system for accelerating ion irradiation sample throughput via lateral gas implantation gradients. https://doi.org/10.1016/j.nimb.2025.165969

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