The Feasibility of Atomic Layer Deposition of Aluminum Oxide on TATB

Miller, John [Lawrence Livermore National Laboratory]; Li, Tian [Lawrence Livermore National Laboratory]; Reeves, Rob [Lawrence Livermore National Laboratory]

doi:10.1002/prep.70263

DOE OSTI · 3691339

The Feasibility of Atomic Layer Deposition of Aluminum Oxide on TATB

Miller, John [Lawrence Livermore National Laboratory]·Li, Tian [Lawrence Livermore National Laboratory]·Reeves, Rob [Lawrence Livermore National Laboratory]

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Miller, John [Lawrence Livermore National Laboratory], Li, Tian [Lawrence Livermore National Laboratory], Reeves, Rob [Lawrence Livermore National Laboratory]. 2026-08-31. The Feasibility of Atomic Layer Deposition of Aluminum Oxide on TATB. https://doi.org/10.1002/prep.70263

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