Angular distribution of Kaufman ion thruster beams
Ion beam envelope and thrust direction of electron bombardment thruster for Jupiter flyby spacecraft
Byers, D. C.↗
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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.
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Ion-beam deposition of thin films of diamondlike carbon
Ion beam deposition of insulating carbon thin films on room temperature substrates, considering transparency, index of refraction, insulating capacity, glass scratching ability, etc
Aisenberg, S.↗
METHOD OF PRODUCING AND ACCELERATING AN ION BEAM
A method of producing and accelerating an ion beam comprising the steps of providing a magnetic field with a cusp that opens in an outward direction along a centerline that passes through a vertex of the cusp: providing an ionizing gas that sprays outward through at least one capillary-like orifice in a plenum that is positioned such that the orifice is on the centerline in the cusp, outward of the vortex of the cusp; providing a cathode electron source, and positioning it outward of the orifice and off of the centerline; and positively charging the plenum relative to the cathode electron source such that the plenum functions as m anode. A hot filament may be used as the cathode electron source, and permanent magnets may be used to provide the magnetic field.
Foster, John E.↗
Fast prototyping of high-aspect ratio, high-resolution x-ray masks by gas-assisted focused ion beam
The capacity of chemically-assisted focused ion beam (fib) etching systems to undertake direct and highly anisotropic erosion of thin and thick gold (or other high atomic number [Z])coatings on x-ray mask membranes/substrates provides new levels of precision, flexibility, simplification and rapidity in the manufacture of mask absorber patterns, allowing the fast prototyping of high aspect ratio, high-resolution masks for deep x-ray lithography.
fast prototyping of high-aspect ratio high-resolut↗
Nozzle geometry optimization for high-current aluminum ion beam acceleration via direct plasma injection scheme
We report the generation of a record aluminum ion beam current exceeding 58 mA at the Al 11+ charge state, accelerated to an energy of 5.5 MeV using the direct plasma injection scheme, which integrates a laser ion source (LIS) with a radio frequency quadrupole (RFQ) accelerator. The effect of nozzle geometry on beam extraction was systematically investigated using 8 and 12 mm tapered designs and an 18 mm cylindrical configuration. The 18 mm nozzle achieved the highest Al 11+ beam current, while the 12 mm aperture provided a favorable balance between beam intensity and current density. Beam extraction simulations confirmed effective RFQ matching across multiple charge states, and solenoidal field tuning further enhanced plasma collimation. This work not only establishes a new benchmark for high-current ion beam generation but also provides a fundamental understanding of plasma–beam interface dynamics crucial for the next generation of high-intensity particle accelerators, particularly those employing LIS-RFQ systems.
73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗
Ion beam applications research - A 1981 summary of Lewis Research Center programs
In 1975 the NASA's Lewis Research Center initiated a technology specific spinoff program to more broadly utilize benefits resulting from ion thruster technology. An Ion Beam Applications Research (IBAR) program was organized to enable the development of new or improved materials, products, and processes through the nonpropulsive application of ion thruster technology. Focused efforts to identify, evaluate, develop and transfer applications to the user community were conducted. A summary of the NASA Lewis Research Center's in-house, grant, and contract projects involving IBAR is given. Specific application efforts utilizing ion beam sputter etching, deposition, and texturing are discussed as well as ion source and component technology applications.
Banks, B. A.↗
Ion-beam excitation effects on the single charge transfer between argon and nitrogen.
Ion-beam excitation effects on single charge transfer between argon and nitrogen
ELECTRON ENERGY↗
Pulsed ion beam investigation of the kinetics of surface reactions
Pulsed ion beam measurements of the kinetics of surface reactions are discussed for the case where the width of the ion pulse is comparable to the measured reaction time, but short compared to the time between successive pulses. Theoretical expressions are derived for the time dependence of the ion-induced signals for linear surface reactions. Results are presented for CO emission from surface carbon and CF emission from Teflon induced by oxygen ion bombardment. The strengths and limitations of this technique are described.
Horton, C. C.↗
Ion-beam-induced topography and surface diffusion
It is pointed out that the development of surface topography along with enhanced surface and bulk diffusion processes accompanying ion bombardment have generated growing interest among users of ion beams and plasmas for thin film or material processing. Interest in these processes stems both from attempts to generate topographic changes for specific studies or applications and from the need to suppress or control undesirable changes. The present investigation provides a summary of the current status of impurity-induced texturing, with emphasis on recent developments. Particular attention is given to the texturing accompanying deposition of an impurity material onto a solid surface while simultaneously etching the surface with an ion beam. A description of experimental considerations is provided, and a thermal-diffusion model is discussed along with the development of sputter cones, and aspects of impact-enhanced surface diffusion.
Robinson, R. S.↗
Ion beam sputter modification of the surface morphology of biological implants
The surface chemistry and texture of materials used for biological implants may significantly influence their performance and biocompatibility. Recent interest in the microscopic control of implant surface texture has led to the evaluation of ion beam sputtering as a potentially useful surface roughening technique. Ion sources, similar to electron bombardment ion thrusters designed for propulsive applications, are used to roughen the surfaces of various biocompatible alloys or polymer materials. These materials are typically used for dental implants, orthopedic prostheses, vascular prostheses, and artificial heart components. Masking techniques and resulting surface textures are described along with progress concerning evaluation of the biological response to the ion beam sputtered surfaces.
Weigand, A. J.↗
Ion-beam-sputter modification of the surface morphology of biological implants
The surface chemistry and texture of materials used for biological implants may significantly influence their performance and biocompatibility. Recent interest in the microscopic control of implant surface texture has led to the evaluation of ion-beam sputtering as a potentially useful surface roughening technique. Ion sources, similar to electron-bombardment ion thrusters designed for propulsive applications, are used to roughen the surfaces of various biocompatible alloys or polymer materials. These materials are typically used for dental implants, orthopedic prostheses, vascular prostheses, and artificial heart components. Masking techniques and resulting surface textures are described along with progress concerning evaluation of the biological response to the ion-beam-sputtered surfaces.
Weigand, A. J.↗
Ion beam sputter deposited diamond like films
A single argon ion beam source was used to sputter deposit carbon films on fused silica, copper, and tantalum substrates under conditions of sputter deposition alone and sputter deposition combined with simultaneous argon ion bombardment. Simultaneously deposited and ion bombarded carbon films were prepared under conditions of carbon atom removal to arrival ratios of 0, 0.036, and 0.71. Deposition and etch rates were measured for films on fused silica substrates. Resulting characteristics of the deposited films are: electrical resistivity of densities of 2.1 gm/cu cm for sputter deposited films and 2.2 gm/cu cm for simultaneously sputter deposited and Ar ion bombarded films. For films approximately 1700 A thick deposited by either process and at 5550 A wavelength light the reflectance was 0.2, the absorptance was 0.7, the absorption coefficient was 67,000 cm to the -1 and the transmittance was 0.1.
Banks, B. A.↗
Ion beam sputtering of liquid metals.
Sputtering yields and energy-transfer efficiency measurements by ion beam sputtering of liquid metals indicate no justification for incorporation into low thrustor
METAL PARTICLE↗
Numerical simulations of auroral plasma processes. I - Ion beams and conics. II - Electric fields
The characteristics of ion beams and conics as seen in two-dimensional numerical simulations in which the plasmas are driven by current sheets of a finite thickness are described. It is shown that the most energetic ions in the simulations have pitch angles near 90 deg, implying a large perpendicular acceleration of the ions. Large perpendicular electric fields, similar to those measured in electrostatic shocks, are mainly confined near the edges of the current sheets, where E-perpendicular is much larger than E-parallel. Double layers with E-perpendicular about equal to, and spatially separated from, E-parallel form in the interior of wide current sheets. Such double layers have upward electric fields in the region of the upward current. Downward electric fields develop outside the current sheet.
Singh, Nagendra↗
Ion beam texturing
A microscopic surface texture was created by sputter-etching a surface while simultaneously sputter-depositing a lower sputter yield material onto the surface. A xenon ion-beam source was used to perform the texturing process on samples as large as 3-cm diameter. Textured surfaces have been characterized with SEM photomicrographs for a large number of materials including Cu, Al, Si, Ti, Ni, Fe, stainless steel, Au, and Ag. A number of texturing parameters are studied including the variation of texture with ion-beam powder, surface temperature, and the rate of texture growth with sputter etching time.
Hudson, W. R.↗
Method of making an ion beam sputter-etched ventricular catheter for hydrocephalus shunt
The centricular catheter comprises a multiplicity of inlet microtubules. Each microtubule has both a large opening at its inlet end and a multiplicity of microscopic openings along its lateral surfaces. The microtubules are perforated by an ion beam sputter etch technique. The holes are etched in each microtubule by directing an ion beam through an electro formed mesh mask producing perforations having diameters ranging from about 14 microns to about 150 microns. This structure assures a reliable means for shunting cerebrospinal fluid from the cerebral ventricles to selected areas of the body.
Banks, B. A.↗
Toward Automated Plasma Focus Ion Beam Instrument Calibration for Materials Processing [Poster]
To accelerate the transition to autonomous focused ion beam (FIB) microscopy, we require an objective figure of merit (FOM) for assessing calibration. For our purposes, these FOMs related to beam astigmatism, quad, and focus. Intelligent calibration integrated into scripted workflows will enable fully automated sample preparation workflows that produce higher quality samples with less operator time.
97 MATHEMATICS AND COMPUTING↗
Optical interference for the guidance of cryogenic focused ion beam milling beyond the axial diffraction limit
Cryogenic focused ion beam (Cryo-FIB) milling has become a standard step in the cryogenic electron tomography (Cryo-ET) workflow and is required to thin cells to electron-semitransparency. However, this destructive process removes the vast majority of the cellular material and raises a critical question: what thin section should be preserved for Cryo-ET analysis? Using a tri-coincident cryogenic FIB-SEM-LM system, we identify an interferometric optical response that can be used for targeting lamella production to fluorescently labeled structures with accuracy beyond the diffraction limit. Here we demonstrate this approach using synthetic samples of fluorescent beads embedded in micron-scale droplets of amorphous ice. We then apply the approach to capture virions inside host cells. Successful targeting is confirmed by Cryo-ET revealing clusters of virions in intracellular vesicles. The method does not require any fluorescent fiducials or axial registration and can be performed on any fluorescently labeled structure that is visible in widefield fluorescence microscopy.
Cryoelectron microscopy↗