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At least 343 records · Page 19

Detection of CMOS bridging faults using minimal stuck-at fault test sets

The performance of minimal stuck-at fault test sets at detecting bridging faults are evaluated. New functional models of circuit primitives are presented which allow accurate representation of bridging faults under switch-level simulation. The effectiveness of the patterns is evaluated using both voltage and current testing.

Ijaz, Nabeel↗

Detection of feed-through faults in CMOS storage elements

In testing sequential circuits, internal faults in the storage elements (SE's) are sometimes modeled as stuck-at faults in the combinational circuits surrounding the SE. The detection of some transistor-level faults that cannot be modeled as stuck-at are considered. These feed-through faults cause the cell to become either data-feed-through, which makes the cell combinational, or clock-feed-through, which causes the clock signal or its complement to appear at the output. Under such faults, the cell does not function as a memory element. Here it is shown that such faults may or may not be detected depending on delays involved. Conditions under which race-ahead occurs are identified.

Al-Assadi, Waleed K.↗

Multiple single event upsets in CMOS static rams

The occurrence of multiple upset errors during ground tests can contaminate the data and lead to error cross sections which are too high. In space, multiple errors may produce higher upsets than predicted and if they occur in single words they can defeat error detection and correction hardware. This investigation involves data which were taken during an experimental study of dose imprint effects in static memories. The results show that multiple errors occurred mainly for heavy ions with high linear energy transfers and with the majority of these in the soft upset sections of the dose-imprinted memory samples. The percentages of the total number of errors which were singles, doubles, and triplets, were determined as a function of LET, dose, and soft or hard section of the devices. The experimental observations are compared to the predictions of simple binomial statistics.

Stassinopoulos, E. G.↗

An Orifice Pulse Tube Cooler for CMOS Computer Cooling

The subject orifice pulse tube cooler employs dual opposed compressor pistons, clearance seals, moving coil linear motors, and flexible bearings cooling capacity is 100 watts at 200 K. A matrix of optimizations explored load temperatures and cooling capacities of 50 K, 100 K, 200 K, 1 watt, 10 watts, and 100 watts. The optimization process resulted in a design with zero second entrance flow and a non-resonant pulse tube. Topics include performance results, mechanical design, and development problems and solutions. The development seeks to use orifice pulse tube mechanical simplicity to achieve a computer cooler with acceptable efficiency, low materials cost, low labor cost, long life, high reliability, low vibration, operation at the standard 60 Hz U.S. grid frequency, and control through simple drive and control electronics.

Riggle, P.↗

High Electron Mobility Transistor Structures on Sapphire Substrates Using CMOS Compatible Processing Techniques

System-on-a-chip (SOC) processes are under intense development for high-speed, high frequency transceiver circuitry. As frequencies, data rates, and circuit complexity increases, the need for substrates that enable high-speed analog operation, low-power digital circuitry, and excellent isolation between devices becomes increasingly critical. SiGe/Si modulation doped field effect transistors (MODFETs) with high carrier mobilities are currently under development to meet the active RF device needs. However, as the substrate normally used is Si, the low-to-modest substrate resistivity causes large losses in the passive elements required for a complete high frequency circuit. These losses are projected to become increasingly troublesome as device frequencies progress to the Ku-band (12 - 18 GHz) and beyond. Sapphire is an excellent substrate for high frequency SOC designs because it supports excellent both active and passive RF device performance, as well as low-power digital operations. We are developing high electron mobility SiGe/Si transistor structures on r-plane sapphire, using either in-situ grown n-MODFET structures or ion-implanted high electron mobility transistor (HEMT) structures. Advantages of the MODFET structures include high electron mobilities at all temperatures (relative to ion-implanted HEMT structures), with mobility continuously improving to cryogenic temperatures. We have measured electron mobilities over 1,200 and 13,000 sq cm/V-sec at room temperature and 0.25 K, respectively in MODFET structures. The electron carrier densities were 1.6 and 1.33 x 10(exp 12)/sq cm at room and liquid helium temperature, respectively, denoting excellent carrier confinement. Using this technique, we have observed electron mobilities as high as 900 sq cm/V-sec at room temperature at a carrier density of 1.3 x 10(exp 12)/sq cm. The temperature dependence of mobility for both the MODFET and HEMT structures provides insights into the mechanisms that allow for enhanced electron mobility as well as the processes that limit mobility, and will be presented.

Mueller, Carl↗

Buried Oxide Densification for Low Power, Low Voltage CMOS Applications

Special technology and circuit architecture are of growing interest for implementation of circuits which operate at low supply voltages and consume low power levels without sacrificing performance[1]. Use of thin buried oxide SOI substrates is a primary approach to simultaneously achieve these goals. A significant aspect regarding SIMOX SOI for low voltage, low power applications is the reliability and performance of the thin buried oxide. In addition, when subjected to high total dose irradiation, the silicon islands within the BOX layer of SIMOX can store charges and significantly effect the back channel threshold voltages of devices. Thus, elimination of the islands within the buried oxide (BOX) layer is preferred in order to prevent leakage through these conductive islands and charge build-up within the buried oxide layer. A differential (2-step) ramp rate as applied to full and 100 nm BOX SIMOX was previously reported to play a significant role in the stoichiometry and island formation within the buried layer[2]. This paper focus is on the properties of a thin (120nm) buried oxide as a function of the anneal ramp rate and the temperature of anneal. In this research, we have found an improvement in the buried oxide stoichiometry with the use of a slower, singular ramp rate for specified thin buried oxides, with slower ramp rates and higher temperatures of anneal suggested for reducing the presence of Si islands within the BOX layer.

Allen, L. P.↗

CMOS Active Pixel Sensor Star Tracker with Regional Electronic Shutter

The guidance system in a spacecraft determines spacecraft attitude by matching an observed star field to a star catalog....An APS(active pixel sensor)-based system can reduce mass and power consumption and radiation effects compared to a CCD(charge-coupled device)-based system...This paper reports an APS (active pixel sensor) with locally variable times, achieved through individual pixel reset (IPR).

active pixel sensor CCD↗

Dynamically re-configurable CMOS imagers for an active vision system

A vision system is disclosed. The system includes a pixel array, at least one multi-resolution window operation circuit, and a pixel averaging circuit. The pixel array has an array of pixels configured to receive light signals from an image having at least one tracking target. The multi-resolution window operation circuits are configured to process the image. Each of the multi-resolution window operation circuits processes each tracking target within a particular multi-resolution window. The pixel averaging circuit is configured to sample and average pixels within the particular multi-resolution window.

Yang, Guang↗