NASA NTRS · 20060030484
A CMOS-compatible process technique for fabricating laterally embedded multi-nanaochannels without sacrificial etching
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Yang, E., Lee, C., Myung, N., George, T.. 2003-06-08. A CMOS-compatible process technique for fabricating laterally embedded multi-nanaochannels without sacrificial etching. https://ntrs.nasa.gov/citations/20060030484
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