Improved carbon electrode reduces arc sputtering
Carbon rod cores with a smaller proportion of rare earth compounds than in standard cores reduce arc sputtering in optical equipment. This core is produced without additional cost or equipment.
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Carbon rod cores with a smaller proportion of rare earth compounds than in standard cores reduce arc sputtering in optical equipment. This core is produced without additional cost or equipment.
Sputtering yields, angular and energy distribution of atoms, and implanted ion distribution in cesium and mercury surface interactions
Sputtered molybdenum disulfide film deposition and friction characteristics in vacuum
Yield and angular distribution measurements of cesium ion and mercury ion sputtering
Sputtering yields and energy transfer efficiency of ion bombarded liquid metals for application in electrostatics ion thrustors for space propulsion
Design and performance of ultrahigh vacuum system for direct current sputtering electrodes
Sputtered atoms angular distribution measured by collecting atoms on Cu surface and determining surface densities of thin films by electron microprobe
Physical sputtering deposition of molybdenum disulfide films as solid lubricant on rotating and sliding components, discussing lubrication properties in vacuum
Cu single crystal sputtering yield and angular distribution for bombardment by Ar ions
Sputtered alumina coatings for abrasion protection of polycarbonate space helmets
Friction and contact resistance during sliding in vacuum of low resistivity metals lubricated with sputtered molybdenum disulfide
Physical sputtering deposition of molybdenum disulfide films as solid lubricant on rotating and sliding components, discussing lubrication properties in vacuum
Resistivity, capacitance and dielectric loss measurements for diode reactive sputtering grown AlN films and film sandwich structures of Ta, Au and Al films
Solid film lubricants deposited by DC triode sputtering on Ni, Ni-Cr and Nb surfaces friction tested under ultrahigh vacuum conditions
Sputtering electrode system design for regeneration of targets within accelerator
Coefficient of friction for sputtered solid film lubricants
Effects of varying RF sputtering parameters on dielectric properties of Teflon thin film capacitors
Tantalum RF sputtered superconducting films structure and properties at various substrate temperatures, observing bcc, fcc and amorphous phases by electron microscopy