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At least 397 records · Page 22

Sputtered gold mask for deep chemical etching of silicon

Sputtered mask resists chemical attack from acid and has adherence to withstand prolonged submergence in etch solution without lifting from silicon surface. Even under prolonged etch conditions with significant undercutting, gold mask maintained excellent adhesion to silicon surface and imperviousness to acid.

Pisciotta, B. P.

Improved multiple-target sputtering equipment

Sputtering chamber has been developed with multiple target. Several film layers can be deposited without repeated evacuation and refilling. Contamination through exposure to air is eliminated.

Shima, R.

Morphological growth of sputtered MoS2 films

Sputtered MoS2 films from 300 A to 20,000 A thick were deposited on metal and glass surfaces. The substrate effects such as surface temperature, finish, pretreatment and chemistry as they affect the film formation characteristics were investigated by optical, electron transmission, electron diffraction, and scanning electron microscopy. Substrate temperature and surface chemistry were found to be the prime variables as to the formation of a crystalline or amorphous film. The friction characteristics are strictly influenced by the type of film formed. Surface chemistry and surface pretreatment account for compound formation and corresponding grain growth, which directly affect the adhesion characteristics, resulting in poor adherence. The type of surface finish (topography) as related to scratches, impurities, inhomogeneities, etc., are favorable nucleation sites for the growth of isolated and complex nodules within the film, and various complex surface overgrowths on the film. These nodular growth features have progressively more undesirable effects on the film behavior as the film thickness increases.

Spalvins, T.

Nodular growth in thick-sputtered metallic coatings

Thick-sputtered S-Monel, silver, and 304 stainless steel coatings were deposited on mica and metal substrates with various surface finishes to investigate the nodular growth in the coating by scanning electron microscopy. The geometry and the surface structure of the nodules are characterized. Compositional changes within the coating were analyzed by energy dispersive X-ray analysis. Defects in the surface finish (i.e., scratches, inclusions, etc.), act as preferential nucleation sites and form isolated and complex nodules and various surface overgrowths in the coating. The nodule boundaries are very vulnerable to chemical etching and these nodules do not disappear after full annealing. Further, they have undesirable effects on mechanical properties; cracks are initiated at the nodules when the coating is stressed by mechanical forces. These effects are illustrated by micrographs. Nodular growth within a coating can be minimized or eliminated by increasing the surface smoothness.

Spalvins, T.

Solutions for discharge chamber sputtering and anode deposit spalling in small mercury ion thrusters

Small electron bombardment mercury ion thrusters are considered for attitude-control and station-keeping operations in the case of earth synchronous satellites. The required operational lifetimes of the order of 20,000 hours could present problems because of the occurrence of sputter erosion of thruster discharge chamber components. The investigation reported is concerned with a study of these problems and the development of approaches for overcoming them.

Power, J. L.

Effects of dc bias on the fabrication of amorphous GdCo RF sputtered films

An investigation has been conducted on the effects of a dc bias field applied to Gd(1-x)Co(x) thin films during RF sputter deposition. Such films may possess uniaxial magnetic anisotropy with easy axis perpendicular to the plane of the film and may be used in magnetic bubble devices. Uniformity in composition, thickness and magnetic properties has been achieved and film composition has been controlled to within one percent. However, significant variations of magnetic properties were observed from film to film.

Bourne, H. C., Jr.

Scanning electron microscope investigation of the structural growth in thick sputtered coatings

Sputtered S-Monel, silver, and 304 stainless steel coatings and molybdenum disulfide coatings were deposited on mica and metal substrates with various surface finishes to investigate the structural growth of the coating by scanning electron microscopy. The geometry and the surface morphology of the nodules are characterized. Compositional changes within the coating were analyzed by energy dispersive X-ray analysis. Defects in the surface finish act as preferential nucleation sites and form isolated overlapping and complex nodules and various unusual surface overgrowths on the coating. The nodule boundaries are very vulnerable to chemical etching and these nodules do not disappear after full annealing. Further, they have undesirable effects on mechanical properties; cracks are initiated at the nodules when the coating is stressed by mechanical forces.

Spalvins, T.

Morphological growth of sputtered MoS2 films

Sputtered MoS2 films from 300 A to 20,000 A thick were deposited on metal and glass surfaces. The substrate effects such as surface temperature, finish, pretreatment, and chemistry as they affect the film formation characteristics were investigated by optical, electron transmission, electron diffraction, and scanning electron microscopy. Substrate temperature and surface chemistry were found to be the prime variables as to the formation of a crystalline or amorphous film. The friction characteristics are strictly influenced by the type of film formed. Surface chemistry and surface pretreatment account for compound formation and corresponding grain growth, which directly affect the adhesion characteristics, resulting in poor adherence. Scratches, impurities, inhomogeneities, etc., are favorable nucleation sites for the growth of isolated and complex nodules within the film.

Spalvins, T.

Experimental limits on the velocities of sodium atoms sputtered from solid surfaces by hydrogen ions

Optical emission at 589.0 nm by sodium atoms sputtered from solid targets by hydrogen molecular ions was observed, and no accompanying broadening or shifts of this line could be detected relative to that from a laboratory lamp. This allowed an upper limit of about 500,000 cm/sec on the mean speed of ejected sodium atoms to be calculated. The results are consistent with the hypothesis that the atomic sodium cloud surrounding Io is produced by this mechanism.

Stoner, J. O., Jr.

Development of sputtered high temperature coatings for thrust chambers

Adherent insulating coatings were developed for thrust chamber service. The coatings consisted of nickel and a ceramic, and were graded in composition from pure nickel at the thrust chamber wall to pure ceramic at the coating surface. The coatings were deposited by rf sputtering from a target with a reversed composition gradient, which was produced by plasma spraying powder mixtures. The effect of deposition parameters on coating characteristics and adherence is discussed.

Busch, R.

Superconductivity in sputtered CuMO6S8

Samples were prepared by melting the metals, followed by annealing to various temperatures. The result was a structurally weak material. Sputtered films on sapphire substrates were prepared and studied. The substrates give the films mechanical strength and permit easy attachment of electrical leads. Materials were characterized by X-ray diffraction, electron microscopy, electrical resistance vs. temperature, and critical current measurements. Some of the results on CuMo6S8 are presented.

Alterovitz, S.

Friction and wear properties of three hard refractory coatings applied by radiofrequency sputtering

The adherence, friction, and wear properties of thin hard refractory compound coatings applied to 440C bearing steel by radiofrequency sputtering were investigated. Friction and wear tests were done with nonconforming pin on disk specimens. The compounds examined were chromium carbide, molybdenum silicide, and titanium carbide. The adherence, friction, and wear were markedly improved by the application of a bias voltage to the bearing steel substrate during coating deposition. Analysis by X-ray photoelectron spectroscopy indicated that the improvement may be due to a reduction in impurities in bias deposited coatings. A fivefold reduction in oxygen concentration in MoSi2 coating by biasing was noted. Chromium carbide was not effective as an antiwear coating. Molybdenum silicide provided some reduction in both friction and wear. Titanium carbide exhibited excellent friction and antiwear properties at light loads. Plastic flow and transfer of the coating material onto the pin specimen appears to be important in achieving low friction and wear.

Brainard, W. A.

Scanning-electron-microscopy observations and mechanical characteristics of ion-beam-sputtered surgical implant alloys

An electron bombardment ion thruster was used as an ion source to sputter the surfaces of orthopedic prosthetic metals. Scanning electron microscopy photomicrographs were made of each ion beam textured surface. The effect of ion texturing an implant surface on its bond to bone cement was investigated. A Co-Cr-W alloy and surgical stainless steel were used as representative hard tissue implant materials to determine effects of ion texturing on bulk mechanical properties. Work was done to determine the effect of substrate temperature on the development of an ion textured surface microstructure. Results indicate that the ultimate strength of the bulk materials is unchanged by ion texturing and that the microstructure will develop more rapidly if the substrate is heated prior to ion texturing.

Weigand, A. J.

Solar wind sputtering of the Martian atmosphere

The interaction between the solar wind and a planetary atmosphere is evaluated as a cause of atmospheric mass loss. For the case of Mars, calculations suggest that an amount of material has been sputtered which is of the same order as the mass of the present atmosphere.

Haff, P. K.

Application of ion thruster technology to a 30-cm multipole sputtering ion source

A 30-cm electron-bombardment ion source has been designed and fabricated for micromachining and sputtering applications. This source has a multipole magnetic field that employs permanent magnets between permeable pole pieces. An average ion current density of 1 ma/sq cm with 500-eV argon ions was selected as a design operating condition. The ion beam at this operating condition was uniform and well collimated, with an average variation of + or -5 percent over the center 20 cm of the beam at a distance up to 30 cm from the ion source.

Robinson, R. S.

Superconductivity in sputtered CuMo6S8

The superconducting transition temperature and the superconducting upper critical fields for sputtered films of copper-containing ternary molybdenum chalcogenides (chevrel phases) were determined. The theory presented by Werthamer, Helfand, and Hohenberg (WHH) (1966) was used to make computer-generated plots of the superconducting upper critical field values versus the superconducting transition temperature values for various values of the Maki paramagnetic pair-breaking parameter and the spin-orbit scattering parameter. The interpretation of the graph suggests that the experimental data for at least one sample are above the maximum WHH theoretical limit in the lower temperature range. Possible explanations of this situation are discussed. In other calculations, a scaling law was found suitable for determining pinning force densities; this data was used to calculate critical current values. The relation between resistivity and temperature was studied.

Alterovitz, S.

The friction and wear properties of sputtered hard refractory compounds

Several refractory silicide, boride, and carbide coatings were examined. The coatings were applied to type 440C steel surfaces by radio-frequency sputtering. The friction and wear properties of the coatings were found to be related to stoichiometry and impurity content of the bulk coating as well as the degree of interfacial adherence between coating and substrate. Bulk coating stoichiometry could to a large extent be controlled by the application of a negative bias voltage during deposition. Adherence was promoted by the formation of an oxidized layer at the interface. Deliberate preoxidizing of the 440C produced enhanced adherence for many compounds which are related to the formation of a mixed oxide transition region.

Brainard, W. A.

System analysis of plasma centrifuges and sputtering

System analyses of cylindrical plasma centrifuges are presented, for which the velocity field and electromagnetic fields are calculated. The effects of different electrode geometrics, induced magnetic fields, Hall-effect, and secondary flows are discussed. It is shown that speeds of 10000 m/sec can be achieved in plasma centrifuges, and that an efficient separation of U238 and U235 in uranium plasmas is feasible. The external boundary-value problem for the deposition of sputtering products is reduced to a Fredholm integral equation, which is solved analytically by means of the method of successive approximations.

Hong, S. H.