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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 73 records · Page 4
All sourcesNASA NTRSDOE OSTI
NASA NTRSDate not supplied

MISR radiometric camera-by-camera Cloud Mask (MIRCCM_V3)

The MISR instrument consists of nine pushbroom cameras which measure radiance in four spectral bands. Global coverage is achieved in nine days. The cameras are arranged with one camera pointing toward the nadir, four cameras pointing forward and four cameras pointing aftward. It takes 7 minutes for all nine cameras to view the same surface location. The view angles relative to the surface reference ellipsoid, are 0, 26.1, 45.6, 60.0, and 70.5 degrees. The spectral band shapes are nominally gaussian, centered at 443, 555, 670, and 865 nm. The RCCM is derived from the radiance values, and is calculated independently for each camera. Therefore, the amount of apparent cloudiness will vary with view angle, with the oblique view angles generally being more cloudy than the near-nadir ones. Since the RCCM is calculated primarily from the radiance values, it does not work well over snow and ice and will usually confuse clear snow/ice with cloud. It works the best over clear-sky ocean, but other surface types are also of quite good quality. The RCCM product also contains a glint mask for each camera, and this mask is set to true whenever the scattering angles indicate that glint could be possible. This glint mask is not masked out over land; users must do this step themselves. [Location=GLOBAL] [Temporal_Coverage: Start_Date=2000-02-24; Stop_Date=] [Spatial_Coverage: Southernmost_Latitude=-90; Northernmost_Latitude=90; Westernmost_Longitude=-180; Easternmost_Longitude=180].

CLOUD MASK↗
NASA NTRSDate not supplied

MISR radiometric camera-by-camera Cloud Mask (MIRCCM_V4)

The MISR instrument consists of nine pushbroom cameras which measure radiance in four spectral bands. Global coverage is achieved in nine days. The cameras are arranged with one camera pointing toward the nadir, four cameras pointing forward and four cameras pointing aftward. It takes 7 minutes for all nine cameras to view the same surface location. The view angles relative to the surface reference ellipsoid, are 0, 26.1, 45.6, 60.0, and 70.5 degrees. The spectral band shapes are nominally gaussian, centered at 443, 555, 670, and 865 nm. The RCCM is derived from the radiance values, and is calculated independently for each camera. Therefore, the amount of apparent cloudiness will vary with view angle, with the oblique view angles generally being more cloudy than the near-nadir ones. Since the RCCM is calculated primarily from the radiance values, it does not work well over snow and ice and will usually confuse clear snow/ice with cloud. It works the best over clear-sky ocean, but other surface types are also of quite good quality. The RCCM product also contains a glint mask for each camera, and this mask is set to true whenever the scattering angles indicate that glint could be possible. This glint mask is not masked out over land; users must do this step themselves. [Temporal_Coverage: Start_Date=2000-02-24; Stop_Date=] [Spatial_Coverage: Southernmost_Latitude=-90; Northernmost_Latitude=90; Westernmost_Longitude=-180; Easternmost_Longitude=180].

SUN GLINT↗
NASA NTRS2018

New Neural Network Cloud Mask Algorithm Based on Radiative Transfer Simulations

Cloud detection and screening constitute critically important first steps required to derive many satellite data products. Traditional threshold-based cloud mask algorithms require a complicated design process and fine tuning for each sensor, and they have difficulties over areas partially covered with snow/ice. Exploiting advances in machine learning techniques and radiative transfer modeling of coupled environmental systems, we have developed a new, threshold-free cloud mask algorithm based on a neural network classifier driven by extensive radiative transfer simulations. Statistical validation results obtained by using collocated CALIOP and MODIS data show that its performance is consistent over different ecosystems and significantly better than the MODIS Cloud Mask (MOD35 C6) during the winter seasons over snow-covered areas in the mid-latitudes. Simulations using a reduced number of satellite channels also show satisfactory results, indicating its flexibility to be configured for different sensors. Comparedto threshold-based methods and previous machine-learning approaches, this new cloud mask (i) does not rely on thresholds, (ii) needs fewer satellite channels, (iii) has superior performance during winter seasons in mid-latitude areas, and (iv) can easily be applied to different sensors.

cloud mask algorithms↗
DOE OSTI2025

CAMIS: A Cylindrical Active Mask Imaging System

Detecting and locating radiological and nuclear materials at distances of 10 m or more in urban and cluttered environments continues to pose challenges in nuclear security and proliferation detection. Previous approaches have focused on large-area radiation imaging using planar configurations of detectors and passive masks. However, these approaches suffer from limitations such as limited field-of-view (FOV) and reduced detection efficiency due to absorption in the mask. To address these limitations, we have developed the cylindrical active mask imaging system (CAMIS). This system comprises 128 NaI(Tl) (10 cm)3 detectors. These detectors are arranged in a cylindrical configuration, enabling gamma-ray imaging with a full 360° azimuthal FOV. The active mask elements within the system are arranged in a pseudorandom configuration, providing unique encoding for all incident directions within the FOV. CAMIS offers an effective detection area of approximately 1 m2 across the entire 360° FOV in the horizontal plane, achieving a mean angular resolution of 10.9° in the azimuthal direction and 12.9° in the polar direction measured by taking the full-width at half-maximum (FWHM) of a cross-section at the maximum reconstructed intensity.

Lamb, C↗
DOE OSTI2024

Zone plate-based extreme ultraviolet mask microscope with through-pellicle imaging capability

Mirror-based and zone plate-based imaging systems are being used in actinic extreme ultraviolet (EUV) reticle review tools. With regard to zone plates, a short working distance is advantageous in terms of the required spectral bandwidth, manufacturability, and potential throughput and imaging performance. Zone plates therefore typically have a short working distance. The industry has adopted the use of an EUV pellicle to protect the photomask. Imaging photomask through-pellicle requires a working distance larger than 2.5 mm. A zone-plate-based EUV mask microscope with a 3-mm working distance has been commissioned at beamline 11.3.2 of the Advanced Light Source. Through-pellicle imaging at an exposure time of 2 s is demonstrated. The instrument achieves an image contrast of 95% on large features on a photomask with a tantalum-based absorber. Imaging down to 45-nm half pitch (mask scale) is demonstrated. A NILS of 2.55 is achieved on 60-nm half-pitch (mask scale) lines and spaces. These results demonstrate that zone-plate-based imaging systems can meet the requirements of an actinic EUV mask review tool in terms of imaging performance and throughput in an instrument compatible with EUV pellicles.

Extreme ultraviolet↗
NASA NTRS1984

Evaluation of a native vegetation masking technique

A crop masking technique based on Ashburn's vegetative index (AVI) was used to evaluate native vegetation as an indicator of crop moisture condition. A mask of the range areas (native vegetation) was generated for each of thirteen Great Plains LANDSAT MSS sample segments. These masks were compared to the digitized ground truth and accuracies were computed. An analysis of the types of errors indicates a consistency in errors among the segments. The mask represents a simple quick-look technique for evaluating vegetative cover.

Kinsler, M. C.↗
NASA NTRS1988

Temperature stability of Al(x)Ga(1-x)As (x = 0-1) thermal oxide masks for selective-area epitaxy

The use of thermal oxides of Al(x)Ga(1-x)As (x = 0-1) as masking materials for selective-area epitaxy by a organometallic chemical-vapor deposition has been investigated. It was found that the thermal oxide of GaAs is only applicable for low growth temperatures (less than or equal to 600 C), and the addition of aluminum significantly improves the thermal stability of the oxide. The oxide of Al(0.4)Ga(0.6)As is suitable for high-temperature deposition, but there are criteria for the thickness and oxidation temperature. Thin layers of AlAs oxidized at 475 C are excellent masks and allow precise thickness control. Promising results of selective-area deposition using these aluminum oxide masks have been obtained. High-quality single crystal grew in mask openings uniformly surrounded by dense and fine-grain polycrystalline deposits, producing a planar duplication of the original pattern.

Jones, Stephen H.↗
NASA NTRS1994

MANN: A program to transfer designs for diffractive optical elements to a MANN photolithographic mask generator

There are two basic areas of interest for diffractive optics. In the first, the property of wavefront division is exploited for achieving optical fanout, analogous to the more familiar electrical fanout of electronic circuitry. The basic problem here is that when using a simple uniform diffraction grating the energy input is divided unevenly among the output beams. The other area of interest is the use of diffractive elements to replace or supplement standard refractive elements such as lenses. Again, local grating variations can be used to control the amount of bending imparted to optical rays, and the efficiency of the diffractive element will depend on how closely the element can be matched to the design requirements. In general, production restrictions limit how closely the element approaches the design, and for the common case of photolithographic production, a series of binary masks is required to achieve high efficiency. The actual design process is much more involved than in the case of elements for optical fanout, as the desired phase of the optical wavefront over some reference plane must be specified and the phase alteration to be introduced at each point by the diffraction element must be known. This generally requires the utilization of a standard optical design program. Two approaches are possible. In the first approach, the diffractive element is treated as a special type of lens and the ordinary optical design equations are used. Optical design programs tend to follow a second approach, namely, using the equations of optical interference derived from holographic theory and then allowing the introduction of phase front corrections in the form of polynomial equations. By using either of these two methods, diffractive elements can be used not only to compensate for distortions such as chromatic or spherical aberration, but also to perform the work of a variety of other optical elements such as null correctors, beam shapers, etc. The main focus of the project described in this report is how the design information from the lens design program is incorporated into the photolithographic process. It is shown that the MANN program, a photolithographic mask generator, fills the need for a link between lens design programs and mask generation controllers.The generated masks can be used to expose a resist-coated substrate which is etched and then must be re-coated, re-exposed, and re-etched for making copies, just as in the electronics industry.

Matthys, Donald R.↗
NASA NTRS1996

The EOS CERES Global Cloud Mask

To detect long-term climate trends, it is essential to produce long-term and consistent data sets from a variety of different satellite platforms. With current global cloud climatology data sets, such as the International Satellite Cloud Climatology Experiment (ISCCP) or CLAVR (Clouds from Advanced Very High Resolution Radiometer), one of the first processing steps is to determine whether an imager pixel is obstructed between the satellite and the surface, i.e., determine a cloud 'mask.' A cloud mask is essential to studies monitoring changes over ocean, land, or snow-covered surfaces. As part of the Earth Observing System (EOS) program, a series of platforms will be flown beginning in 1997 with the Tropical Rainfall Measurement Mission (TRMM) and subsequently the EOS-AM and EOS-PM platforms in following years. The cloud imager on TRMM is the Visible/Infrared Sensor (VIRS), while the Moderate Resolution Imaging Spectroradiometer (MODIS) is the imager on the EOS platforms. To be useful for long term studies, a cloud masking algorithm should produce consistent results between existing (AVHRR) data, and future VIRS and MODIS data. The present work outlines both existing and proposed approaches to detecting cloud using multispectral narrowband radiance data. Clouds generally are characterized by higher albedos and lower temperatures than the underlying surface. However, there are numerous conditions when this characterization is inappropriate, most notably over snow and ice of the cloud types, cirrus, stratocumulus and cumulus are the most difficult to detect. Other problems arise when analyzing data from sun-glint areas over oceans or lakes over deserts or over regions containing numerous fires and smoke. The cloud mask effort builds upon operational experience of several groups that will now be discussed.

Berendes, T. A.↗
NASA NTRS2000

Modeling and Observations of Phase-Mask Trapezoidal Profiles with Grating-Fiber Image Reproduction

We report on an investigation of the trapezoidal design and fabrication defects in phase masks used to produce Bragg reflection gratings in optical fibers. We used a direct visualization technique to examine the nonuniformity of the interference patterns generated by several phase masks. Fringe patterns from the phase masks are compared with the analogous patterns resulting from two-beam interference. Atomic force microscope imaging of the actual phase gratings that give rise to anomalous fringe patterns is used to determine input parameters for a general theoretical model. Phase masks with pitches of 0.566 and 1.059 microns are modeled and investigated.

Lyons, Donald R.↗
NASA NTRS2006

Utilizing Hierarchical Segmentation to Generate Water and Snow Masks to Facilitate Monitoring Change with Remotely Sensed Image Data

The hierarchical segmentation (HSEG) algorithm is a hybrid of hierarchical step-wise optimization and constrained spectral clustering that produces a hierarchical set of image segmentations. This segmentation hierarchy organizes image data in a manner that makes the image's information content more accessible for analysis by enabling region-based analysis. This paper discusses data analysis with HSEG and describes several measures of region characteristics that may be useful analyzing segmentation hierarchies for various applications. Segmentation hierarchy analysis for generating landwater and snow/ice masks from MODIS (Moderate Resolution Imaging Spectroradiometer) data was demonstrated and compared with the corresponding MODIS standard products. The masks based on HSEG segmentation hierarchies compare very favorably to the MODIS standard products. Further, the HSEG based landwater mask was specifically tailored to the MODIS data and the HSEG snow/ice mask did not require the setting of a critical threshold as required in the production of the corresponding MODIS standard product.

Tilton, James C.↗
NASA NTRS2006

Error response test system and method using test mask variable

An error response test system and method with increased functionality and improved performance is provided. The error response test system provides the ability to inject errors into the application under test to test the error response of the application under test in an automated and efficient manner. The error response system injects errors into the application through a test mask variable. The test mask variable is added to the application under test. During normal operation, the test mask variable is set to allow the application under test to operate normally. During testing, the error response test system can change the test mask variable to introduce an error into the application under test. The error response system can then monitor the application under test to determine whether the application has the correct response to the error.

Gender, Thomas K.↗
NASA NTRS2008

An Automatic Cloud Mask Algorithm Based on Time Series of MODIS Measurements

Quality of aerosol retrievals and atmospheric correction depends strongly on accuracy of the cloud mask (CM) algorithm. The heritage CM algorithms developed for AVHRR and MODIS use the latest sensor measurements of spectral reflectance and brightness temperature and perform processing at the pixel level. The algorithms are threshold-based and empirically tuned. They don't explicitly address the classical problem of cloud search, wherein the baseline clear-skies scene is defined for comparison. Here, we report on a new CM algorithm which explicitly builds and maintains a reference clear-skies image of the surface (refcm) using a time series of MODIS measurements. The new algorithm, developed as part of the Multi-Angle Implementation of Atmospheric Correction (MAIAC) algorithm for MODIS, relies on fact that clear-skies images of the same surface area have a common textural pattern, defined by the surface topography, boundaries of rivers and lakes, distribution of soils and vegetation etc. This pattern changes slowly given the daily rate of global Earth observations, whereas clouds introduce high-frequency random disturbances. Under clear skies, consecutive gridded images of the same surface area have a high covariance, whereas in presence of clouds covariance is usually low. This idea is central to initialization of refcm which is used to derive cloud mask in combination with spectral and brightness temperature tests. The refcm is continuously updated with the latest clear-skies MODIS measurements, thus adapting to seasonal and rapid surface changes. The algorithm is enhanced by an internal dynamic land-water-snow classification coupled with a surface change mask. An initial comparison shows that the new algorithm offers the potential to perform better than the MODIS MOD35 cloud mask in situations where the land surface is changing rapidly, and over Earth regions covered by snow and ice.

Lyapustin, Alexei↗
NASA NTRS2007

Photodetectors on Coronagraph Mask for Pointing Control

It has been proposed to install a symmetrical array of photodetectors about the center of the mask of a coronagraph of the type used to search for planets orbiting remote stars. The purpose of this installation is to utilize the light from a star under observation as a guide in pointing the telescope. Simple arithmetic processing of the outputs of the photodetectors would provide indications of the lateral position of the center of the mask relative to the center of the image of the star. These indications could serve as pointing-control feedback signals for adjusting the telescope aim to center the image of the star on the mask. The widths of central mask areas available for placement of photodetectors differ among coronagraph designs, typically ranging upward from about 100 m. Arrays of photodetectors can readily be placed within areas in this size range. The number of detectors in an array could be as small as 4 or as large as 64. The upper limit on the number of detectors would be determined according to the extent of the occulting pattern and the number of functionalities, in addition to pointing control, to be served by the array.

Balasubramanian, Kunjithapatham↗
NASA NTRS2012

Germanium Lift-Off Masks for Thin Metal Film Patterning

A technique has been developed for patterning thin metallic films that are, in turn, used to fabricate microelectronics circuitry and thin-film sensors. The technique uses germanium thin films as lift-off masks. This requires development of a technique to strip or undercut the germanium chemically without affecting the deposited metal. Unlike in the case of conventional polymeric lift-off masks, the substrate can be exposed to very high temperatures during processing (sputter deposition). The reason why polymeric liftoff masks cannot be exposed to very high temperatures (greater than 100 C) is because (a) they can become cross linked, making lift-off very difficult if not impossible, and (b) they can outgas nitrogen and oxygen, which then can react with the metal being deposited. Consequently, this innovation is expected to find use in the fabrication of transition edge sensors and microwave kinetic inductance detectors, which use thin superconducting films deposited at high temperature as their sensing elements. Transition edge sensors, microwave kinetic inductance detectors, and their circuitry are comprised of superconducting thin films, for example Nb and TiN. Reactive ion etching can be used to pattern these films; however, reactive ion etching also damages the underlying substrate, which is unwanted in many instances. Polymeric lift-off techniques permit thin-film patterning without any substrate damage, but they are difficult to remove and the polymer can outgas during thin-film deposition. The outgassed material can then react with the film with the consequence of altered and non-reproducible materials properties, which, in turn, is deleterious for sensors and their circuitry. The purpose of this innovation was to fabricate a germanium lift-off mask to be used for patterning thin metal films.

Brown, Ari↗
NASA NTRS2024

Dust Model Sensitivity to Dust Source Mask, Sandblasting Efficiency, Air Density, and Land Use: Implications for Model Improvement

This study compares dust storm simulations using two commonly adopted methods for representing four important dust emission parameters. Compared to a dynamic dust source mask based on land use and vegetation cover, a static mask based solely on land use overestimates dust concentration and optical depth by a factor of 2, besides generating spurious emissions. The results reinforce that seasonal variations in vegetation cover can significantly affect dust emissions. For sandblasting efficiency, a clay-dependent semiempirical expression produces 10 times more dust than a physics-based expression. Simulations using model-predicted versus a fixed constant for air density differ by only 8%. However, this difference could range between 12 and 22% for annual simulations over global dust source regions. Simulations with updated versus old land use data, using the same dust source mask, differ twofold, indicating the significant impact of land use change on regional dust emission in central Arizona. The differences in the pairs of these simulations are generally larger than the uncertainty due to meteorology. The simulations align better with observation when using the dynamic dust source mask, the physics-based sandblasting efficiency, and the up-to-date land use data. Given the high sensitivity of dust to surface conditions, the results discussed have implications for improving the dust cycle in weather and climate models and for interpreting model intercomparisons.

Dust-emission source↗
NASA NTRS2001

Fast prototyping of high-aspect ratio, high-resolution x-ray masks by gas-assisted focused ion beam

The capacity of chemically-assisted focused ion beam (fib) etching systems to undertake direct and highly anisotropic erosion of thin and thick gold (or other high atomic number [Z])coatings on x-ray mask membranes/substrates provides new levels of precision, flexibility, simplification and rapidity in the manufacture of mask absorber patterns, allowing the fast prototyping of high aspect ratio, high-resolution masks for deep x-ray lithography.

fast prototyping of high-aspect ratio high-resolut↗
NASA NTRS2005

HEBS and Binary 1-sinc masks simulations, HCIT experiments and results

Based on preliminary experiments and results with a binary 1-sinc mask in the HCIT early in August 2004, we planned for a detailed experiment to compare the performance of HEBS and Binary masks under nearly identical conditions in the HCIT. This report details the design and fabrication of the masks, simulated predictions, and experimental results.

HCIT↗