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At least 73 records · Page 4

Unusually Strong Near‐Infrared Photoluminescence of Highly Transparent Bulk InSe Flakes

Abstract Bulk γ‐InSe has a direct bandgap of 1.24 eV, which corresponds to near infrared wavelengths ( λ = 1.0 µm) useful in optoelectronic applications from biometric detectors to silicon photonics. However, its potential for optoelectronic applications is largely untapped due in part to the lack of quantitative studies of its optical properties. Here, the unusually low absorptance and high photoluminescence quantum efficiency of single‐crystalline InSe flakes with thickness in the hundreds of nanometers are studied. InSe emits brightly at room temperature from its direct bandgap with a peak photoluminescence quantum yield (PLQY) of 20%, despite displaying indirect bandgap like low absorption coefficient due to the symmetry of its crystal structure. By performing pump‐dependent PLQY measurements, the radiative and nonradiative recombination coefficients are extracted, including the Shockley‐Read‐Hall and Auger coefficients. Finally, a proof‐of‐concept alternating current electroluminescent device at low temperature is demonstrated to show the promise of InSe in optoelectronic technology such as highly transparent, bright NIR light sources.

Geng, Jamie↗

Nitrogen recombination on high-temperature reusable surface insulation and the analysis of its effect on surface catalysis

The energy transfer catalytic recombination coefficients for nitrogen and oxygen on a borosilicate glass are determined in nitrogen and air hypersonic arc jet streams. These data, obtained from a reacting boundary-layer analysis with first-order surface reaction kinetics, compare well with earlier results from a Goulard frozen boundary-layer model up to 1600 K. The apparent surface recombination rates increase up to 1600 K, then begin to decrease. To illustrate the effects of temperature and nitrogen dissociation on energy transfer to the glass, a diffusional heat-flux is calculated using the present results from 1450 K up to 1850 K. This diffusional heat-flux is the contribution to the total heating rate by atom recombination, and is used to compare the present results with coefficients from three previous studies.

Kolodziej, Paul↗

Recombination and Mobility of Nuclear Radiation Induced Ionization in Liquid Hydrogen

In the present experiment, a stationary radioactive source (Kr-85) was allowed to produce ionization at a particular location in a flowing stream of liquid hydrogen. By measurement of the ionization collected at various points downstream for various velocities we were able to measure independently the recombination coefficient and the ionic mobility. In addition, we were able to obtain an approximate value of E, the fraction of the volumetric ionization rate which is available for volume recombination and production of ion currents.

Ionization↗

Recombination of electrons with H3(+) and H5(+) ions

A microwave afterglow-mass spectrometer apparatus is used to determine the dissociative recombination coefficients for capture of electrons by H3(+) and H5(+) ions as a function of electron temperature. At an ion and neutral temperature of 240 K, the coefficient for H3(+) is found to vary slowly with the electron temperature at first, decreasing from 1.6 x 10 to the -7th cu cm/s at an electron temperature of 240 K to 1.2 x 10 to the -7th cu cm/s at an electron temperature of 500 K; at electron temperatures ranging from 500 to 3000 K, the coefficient falls as the reciprocal of the electron temperature. It is noted that the results, which have an uncertainty of + or - 20 percent, agree satisfactorily over the common energy range (0.03-0.36 eV) with the recombination cross sections determined in merged beam measurements by Auerbach et al. (1977). Attention is also given to the implication of the results for modeling planetary atmospheres and interstellar clouds.

Macdonald, J. A.↗

The rate coefficient for the O/+/ + N2 reaction in the ionosphere

The rate coefficient for the reaction O(+) + N2 yields NO(+) + N is determined as a function of temperature from the photochemistry of NO(+) for both day and night conditions by using a large sample of simultaneous measurements of ion and neutral concentrations and temperatures made by the Atmosphere Explorer C satellite. The results cover the ion temperature range from 500 to 1200 K. Using recent flow-drift-tube results, the rate coefficient is calculated as a function of ion temperature and mean ion drift velocity for ionospheric conditions. The satellite and laboratory determinations are found to be in good agreement. Using this temperature dependence, an earlier determination of the dissociative recombination coefficient of NO(+) with electrons is refined.

Torr, M. R.↗

Non-catalytic surfaces for metallic heat shields

The magnitude of the atom recombination coefficients needed for metal heat shield surfaces on Shuttle-type vehicles is analyzed and discussed. Prior work which identifies surfaces having low catalytic activity is reviewed. Arc tunnel tests to evaluate catalytic activity are described and the difficulties of such tests are discussed. Results are presented which show major differences between atom recombination and atom exchange from molecules. Results of surface analysis show that bulk and surface composition of a coating are different.

Swann, R. T.↗

Measurements of recombination of electrons with H3(plus) and H5(plus) ions

The electron-ion recombination coefficients for H3(+) and H5(+) ions were determined by means of a microwave afterglow/mass spectrometer apparatus. Measurements of electron density decays in helium-hydrogen mixtures are correlated with the decay of mass-identified ion currents to the wall of the microwave cavity. At low partial pressures of hydrogen in the mixture, the ion H3(+) dominates the ion composition and the ion wall current tracks the electron density decay curves. From recombination controlled electron density decay curves, the values alpha (H3(+)) = (2.9 + or - 0.3), (2.3 + or - 0.3), and (2.0 + or - 0.2) x 0.0000001 cu cm per sec, are obtained at 205, 300 and 450 K, respectively. At higher partial pressures of hydrogen and low temperatures, where (H5(+)) is the dominant ion, the value alpha (H5(+)) = (3.6 + or - 1.0) x 0.0000001 cu cm per sec is obtained at 205 K. The implications of these results concerning ionization levels in the atmospheres of the outer planets and in the interstellar medium are discussed.

Leu, M. T.↗

Effect of Surface Preparation and Gas Flow on Nitrogen Atom Surface Recombination

The effects of surface preparation and gas flow on the recombination of nitrogen atoms at copper and platinum surfaces were determined. Atoms were generated by an electrodeless 2450-megacycle-per-second discharge, and their concentration was measured by gas-phase titration with nitric oxide. Test surfaces were either vacuum-evaporated films or spheres machined from bulk metal and cemented around small glass-bead thermistors. Heat released by recombination was measured as the difference in electrical energy required to maintain a given thermistor temperature with and without a catalytic surface exposed. Recombination coefficients measured at flow velocities of 1120, 1790, 2250, and 3460 centimeters per second and at pressures of 0.42 and 0.59 millimeter of mercury showed that flow conditions had no effect. The results were also independent of atom concentration. A rough indication of the temperature dependence was obtained; it was greater for copper than for platinum. Platinum films deposited on platinum or on glass had the same activity - about 3 percent of the atoms impinging recombined. With copper, however, the glass substrate greatly reduced the percent of atoms recombining over that of a bulk copper substrate where 4 percent of the impinging atoms recombined. This effect could be overcome by depositing a second film on top of the first. Bulk metal samples were subjected to various surface treatments including polishing, degreasing with a chlorinated hydrocarbon, washing with nitric acid, and rinsing with water. Polished, degreased platinum had low activity compared to an evaporated film, but nitric acid treatment made it equivalent. Polished, degreased copper was only slightly less active than a copper film; nitric acid etching decreased the activity still further, probably by preferentially exposing facets of low catalytic efficiency.

Prok, George M.↗

Measurements of recombination of electrons with HCO(plus) ions

Recombination coefficients of electrons with HCO(+) ions were determined with a microwave afterglow/mass spectrometer apparatus. Afterglow measurements of electron density decays in neon-hydrogen-carbon monoxide mixtures are correlated with the decay of mass-identified ion currents to the wall of the microwave cavity. At the appropriate partial pressures of hydrogen and carbon monoxide in the mixture, the ion HCO(+) dominates the ion composition and its wall current approximately tracks the electron density decay curve. From recombination controlled electron density decay curves, the values alpha (HCO(+)) = (3.3 + or - 0.5) and (2.0 + or - 0.3) 0.0000001 cu cm/sec are obtained at 205 and 300 K, respectively. The implications of these results for models of polyatomic molecule formation in dense interstellar clouds are briefly discussed.

Leu, M. T.↗

Mechanistic model for catalytic recombination during aerobraking maneuvers

Several mechanistic models are developed to predict recombination coefficients for use in heat shield design for reusable surface insulation (RSI) on aerobraking vehicles such as space shuttles. The models are applied over a temperature range of 300 to 1800 K and a stagnation pressure range of 0 to 3,000 Pa. A four parameter model in temperature was found to work best; however, several models (including those with atom concentrations at the surface) were also investigated. Mechanistic models developed with atom concentration terms may be applicable when sufficient data becomes available. The requirement is shown for recombination experiments in the 300 to 1000 K and 1500 to 1850 K temperature range, with deliberate concentration variations.

Willey, Ronald J.↗

First-principles theory of direct-gap optical emission in hexagonal Ge and its enhancement via strain engineering

The emergence of hexagonal Ge (2H-Ge) as a candidate direct-gap group-IV semiconductor for Si photonics mandates a rigorous understanding of its optoelectronic properties. Theoretical predictions of a “pseudodirect” band gap, characterized by weak oscillator strength, contrast with a claimed high radiative recombination coefficient 𝐵 comparable to conventional (cubic) InAs. We compute 𝐵 in 2H-Ge from first principles and quantify its dependence on temperature, carrier density, and strain. For unstrained 2H-Ge, our calculated spontaneous emission spectra corroborate that measured photoluminescence corresponds to direct-gap emission, but with 𝐵 being approximately three orders of magnitude lower than in InAs. We confirm a pseudodirect-to-direct-gap transition under ∼2% [0001] uniaxial tension, which can enhance 𝐵 by up to 3 orders of magnitude, making it comparable to that of InAs. Beyond quantifying the strong enhancement of 𝐵 via strain engineering, our analysis suggests the dominance of additional, as-yet unquantified recombination mechanisms in this nascent material.

36 MATERIALS SCIENCE↗

Repetitively pulsed nanosecond discharge plasma decay in propane–oxygen gas mixture in the presence of a heating electric field

Plasma decay in the afterglow of a repetitively pulsed nanosecond discharge in a stoichiometric propane–oxygen mixture was experimentally investigated when a weak heating DC electric field was applied and in its absence. The discharge was ignited at room gas temperature and a pressure of 1–2 Torr and was characterized by low specific energy inputs (<0.004 eV per molecule in one pulse). Using microwave interferometry, the temporal evolution of the electron density during plasma decay was studied, and the effective recombination coefficients were obtained from data processing. It was shown that the rate of plasma decay behaved in a non-monotonic manner with increasing degree of propane oxidation; at first the decay rate grew, then passed through a maximum, fell and saturated in the limit of a large (~2000) number of pulses. In this limit, the effect of the heating DC electric field on the plasma decay decreased with approaching chemical equilibrium. Numerical simulation of the observed effects was performed for low and high oxidation degrees of propane taking into account changes in the composition of positive ions in the plasma. Good agreement was obtained between measurements and calculations of the electron density during plasma decay in these cases. Here it was shown that the formation of cluster ions in the discharge afterglow plays a fundamental role. The plasma decay was controlled by electron recombination with hydrocarbon cluster ion at low oxidation degree of propane and with water cluster (hydrated) ions at high oxidation degree. A hypothesis was proposed to explain the observed nonmonotonic behavior of the plasma decay rate with an increase in the propane oxidation in the discharge, based on the formation of hydrated hydrocarbon ions C x H y + (H 2 O) k at moderate oxidation degrees.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Atomic and ionic hydrogen flux probe for quantitative in-situ monitoring of hydrogen recycling

A new combination diagnostic as a hydrogen recycling monitor in harsh conditions is proposed. Combining permeation membrane probe with a Langmuir probe provides a possibility to measure both atomic and ionic hydrogen fluxes to plasma facing components. A brief overview of permeation probes is given. The range of measurable H fluxes is from 10 16 to more than 10 20 H m –2 s –1 . Time response of the permeation probe is ~ 0.1–0.5 s. A method to address disadvantages of permeation probes is proposed. This includes an introduction of a preparation chamber for Ar-plasma cleaning of the membrane and absolute calibration with a visible spectroscopy. The hydrogen recombination coefficient, evaluated in such calibration, is k u = 5.9 × 10 –30 m 4 s –1 , which agrees well with previous research.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Dynamics of deuterium retention and desorption from plasma-facing materials in fusion reactor-relevant conditions

Hydrogen isotopes retention and desorption during and after discharges in fusion devices are still not well understood due to the complex device conditions and limitations of in-situ diagnostics and measurements. Here, we simulated well-diagnosed recent experiments at the DIII-D facility to benchmark our ITMC-DYN integrated package of modeling deuterium diffusion, retention, and desorption during and after D discharge irradiation. Modeling results were compared with detail experimental data of D desorption fluxes for various irradiation conditions. We predicted the temporal evolution of free and trapped D distribution in tungsten (W) plasma-facing material (PFM). Effects of key parameters namely diffusion coefficient, recombination rate, trapping energies against different defect types, were examined in these simulations. Existing experimental data of these parameters in literature varies significantly which makes it harder to identify key mechanisms and physics responsible for hydrogen isotope retention and desorption. The purpose of this work is to accurately simulate recent well-diagnosed reactor experiments given the uncertainties in such parameters and identify mechanisms responsible for the retention and desorption. We implemented the best identified diffusion, recombination, and trapping parameters in ITMC-DYN package that integrate both various collisional and thermal processes. We predicted, for example, that sample cooling between discharges in DIII-D operations can significantly affect the spatial distribution of trapped D in W under reactor irradiation conditions. Correct prediction of desorption spectra from samples irradiated during 10 DIII-D discharges showed that up to 35% of D can be retained in high binding energy defects such as vacancy clusters or voids.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Impact of quantum well thickness on efficiency loss in InGaN/GaN LEDs: Challenges for thin-well designs

We investigate the impact of quantum well (QW) thickness on efficiency loss in c-plane InGaN/GaN LEDs using a small-signal electroluminescence technique. Multiple mechanisms related to efficiency loss are independently examined, including injection efficiency, carrier density vs current density relationship, phase space filling, quantum-confined Stark effect, and Coulomb enhancement. An optimal QW thickness of around 2.7 nm in these InGaN/GaN LEDs was determined for QWs having constant In composition. Despite improved control of deep-level defects and lower carrier density at a given current density, LEDs with thin QWs still suffer from an imbalance in enhancement effects on the radiative and intrinsic Auger–Meitner recombination coefficients. The imbalance in enhancement effects results in a decline in internal quantum efficiency and radiative efficiency with decreasing QW thickness at low current density in LEDs with QW thicknesses below 2.7 nm. Here, we also investigate how LED modulation bandwidth varies with QW thickness, identifying the key trends and their implications for device performance.

36 MATERIALS SCIENCE↗

Role of the junction voltage on the overflow current in light-emitting diodes

Quantum-well (QW)-based light emitters, such as light-emitting diodes (LEDs) and lasers, of various semiconductor materials experience a reduction in their efficiency when operating at higher temperatures, a phenomenon referred to as “thermal droop.” Among the various claims on the origins of thermal droop, an increased overflow current with increasing temperatures is a common contender. Since overflow of carriers can only occur when the junction voltage 𝑉 Junction approaches the built-in voltage 𝑉 BI of any diodes, we develop a simple method relating the difference between 𝑉 Junction and 𝑉 BI to approximate the upper limit of overflow occurring in QW-based light-emitting diodes. The measured difference between 𝑉 Junction and 𝑉 BI of state-of-the-art commercial blue and green In⁢Ga⁢N-based LEDs at temperatures up to ∼450 K suggests negligible overflow. To further experimentally verify the absence of overflow, we perform temperature-dependent electron emission spectroscopy on the same commercial blue and green LEDs and find no evidence of thermally enhanced overflow carriers up to ∼450 K. In agreement with our claims that 𝑉 Junction must approach 𝑉 BI for overflow to occur, two-dimensional temperature-dependent electrical simulations of violet, blue, and green LEDs including alloy disorder and V-defects demonstrate that overflow can be significant in violet LEDs, where the small band offset between the In⁢Ga⁢N QW and Ga⁢N cladding layers due to the larger QW bandgap requires larger 𝑉 Junction to reach standard operating current densities, thereby approaching 𝑉 BI . By contrast, simulations indicate that overflow is negligible in blue and green LEDs, whose smaller QW bandgaps result in smaller quasi-Fermi levels difference to reach significant carrier injection, resulting in a 𝑉 Junction much smaller than 𝑉 BI up to large operating current densities. Considering that overflow is negligible in blue and longer-wavelength LEDs, and our observations of the large thermal droop occurring at low current densities, where Shockley-Read-Hall (SRH) recombination dominates, we conclude that thermally enhanced SRH processes are the most significant contributor to thermal droop. Finally, we also simulate the carrier densities in the different QWs of a multiple-QW LED and observe a reduction in the total carrier density at a given operating current density, which results in a decrease in the total Auger-Meitner current of the LED from just the thermally enhanced carrier redistribution among QWs without taking any possible additional temperature dependence of their recombination coefficients. Taking all this into account, minimizing thermal droop effects in LEDs can be achieved by a reduction in defect density, using wider band gap p-n junction-defining cladding layers, and operating at higher currents.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Large-scale efficient mid-wave infrared optoelectronics based on black phosphorus ink

The mid-wave infrared (MWIR), ranging from 2 to 5 micrometers, is of substantial interest for chemical sensing, imaging, and spectroscopy. Black phosphorus (bP)–based MWIR light emitters and detectors have been shown to outperform the state-of-the-art for commercial devices due to the low Auger recombination coefficient of bP. However, the scalability of these devices remains a challenge. Here, we report a bP ink formula that preserves the exceptional MWIR optoelectronic properties of bP to deposit centimeter-scale, uniform, and pinhole free films with a photoluminescence quantum yield higher than competing III-V and II-VI semiconductors with similar bandgaps at high excitation regime. As a proof of concept, we use bP ink as a “phosphor” on a red commercial light-emitting diode to demonstrate bright MWIR light emission. We also show that these films can be integrated into heterostructure device architectures with electron and hole selective contacts for direct-injected light emission and detection in MWIR.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗