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At least 127 records · Page 7

The Surprising Absence of Absorption in the Far-ultraviolet Spectrum of Mrk 231

Mrk 231, the nearest (z = 0.0422) quasar, hosts both a galactic-scale wind and a nuclear-scale iron low-ionization broad absorption line (FeLoBAL) outflow. We recently obtained a far-ultraviolet (FUV) spectrum of this object covering approx. 1150-1470A with the Cosmic Origins Spectrograph on board the Hubble Space Telescope. This spectrum is highly peculiar, highlighted by the presence of faint (< or approx.2% of predictions based on H(alpha)), broad (> or approx.10,000 km/s at the base), and highly blueshifted (centroid at approx. 3500 km/s) Ly(aplpha) emission. The FUV continuum emission is slightly declining at shorter wavelengths (consistent with F(sub lambda) Alpha Lambda(sup 1.7)) and does not show the presence of any obvious photospheric or wind stellar features. Surprisingly, the FUV spectrum also does not show any unambiguous broad absorption features. It thus appears to be dominated by the AGN, rather than hot stars, and virtually unfiltered by the dusty FeLoBAL screen. The observed Ly(alpha) emission is best explained if it is produced in the outflowing BAL cloud system, while the Balmer lines arise primarily from the standard broad emission line region seen through the dusty (Av approx. 7 mag) broad absorption line region. Two possible geometric models are discussed in the context of these new results.

Veilleux, S.↗

Recent Progress on 2012 SAT for UVOIR Coatings

Astronomical observations in the Far Ultraviolet (FUV) spectral region are some of the more challenging due to the very distant and faint objects that are typically searched for in cosmic origin studies such as origin of large scale structure, the formation, evolution, and age of galaxies and the origin of stellar and planetary systems. These challenges are driving the need to improve the performance of optical coatings over a wide spectral range that would increase reflectance in mirrors and reduced absorption in dielectric filters used in optical telescope for FUV observations. This paper will present recent advances in reflectance performance for Al+MgF2 mirrors optimized for Lyman-alpha wavelength by performing the deposition of the MgF2 overcoat at elevated substrate temperatures. We will also present optical characterization of little studied rare-earth fluorides such as GdF3 and LuF3 that exhibit low-absorption over a wide wavelength range and could therefore be used as high refractive index alternatives fordielectric coatings at FUV wavelengths.

LiF↗

The Surface Compositon of Enceladus: Clues from the Ultraviolet

The reflectance of Saturn's moon Enceladus has been measured at far ultraviolet (FUV) wavelengths (115-190 nm) by Cassini's UltraViolet Imaging Spectrograph (UVIS). At visible and near infrared (VNIR) wavelengths Enceladus' reflectance spectrum is very bright, consistent with a surface composed primarily of H2O ice. At FUV wavelengths, however, Enceladus is surprisingly dark - darker than would be expected for pure water ice. We find that the low FUV reflectance of Enceladus can be explained by the presence of a small amount of NH3 and a small amount of a tholin in addition to H?O ice on the surface.

satellites↗

Optical Design for CETUS a Wide-Field 1.5-m Aperture UV Payload Being Studied for a NASA Probe Class Mission Study

As part of a study funded by NASA headquarters, we are developing a probe-class mission concept called the Cosmic Evolution through UV Spectroscopy (CETUS). CETUS includes a 1.5-m aperture diameter telescope with a large field of view (FOV). CETUS includes three scientific instruments: a far ultraviolet (FUV) and near ultraviolet (NUV) imaging camera (CAM); a NUV multiobject spectrograph (MOS); and a dual-channel point/slit spectrograph (PSS) in the Lyman ultraviolet (LUV), FUV, and NUV spectral regions. The large FOV three-mirror anastigmatic (TMA) optical telescope assembly (OTA) simultaneously feeds the three separate scientific instruments. That is, the instruments view separate portions of the TMA image plane, enabling parallel operation by the three instruments. The field viewed by the MOS, whose design is based on an Offner-type spectrographic configuration to provide wide FOV correction, is actively configured to select and isolate numerous field sources using a next-generation micro-shutter array. The two-channel CAM design is also based on an Offner-like configuration. The PSS performs high spectral resolution spectroscopy on unresolved objects over the NUV region with spectral resolving power, R ~ 40,000, in an echelle mode. The PSS also performs long-slit imaging spectroscopy at R ~ 20,000 in the LUV and FUV spectral regions with two aberration-corrected, blazed, holographic gratings used in a Rowland-like configuration. The optical system also includes two fine guidance sensors, and wavefront sensors that sample numerous locations over the full OTA FOV. In-flight wavelength calibration is performed by a wavelength calibration system, and flat-fielding is also performed, both using in-flight calibration sources. We describe the current optical design of CETUS and the major trade studies leading to the design.

space sensors↗

Discovery of an Extremely Short Duration Flare from Proxima Centauri Using Millimeter through Far-ultraviolet Observations

We present the discovery of an extreme flaring event from Proxima Cen by the Australian Square Kilometre Array Pathfinder(ASKAP), Atacama Large Millimeter/submillimeter Array(ALMA), Hubble Space Telescope(HST),Transiting Exoplanet Survey Satellite(TESS), and the du Pont Telescope that occurred on 2019 May 1. In the millimeter and FUV, this flare is the brightest ever detected, brightening by a factor of>1000 and>14,000 as seen by ALMA and HST, respectively. The millimeter and FUV continuum emission trace each other closely during the flare, suggesting that millimeter emission could serve as a proxy for FUV emission from stellar flares and become a powerful new tool to constrain the high-energy radiation environment of exoplanets. Surprisingly, optical emission associated with the event peaks at a much lower level with a time delay. The initial burst has an extremely short duration, lasting for<10 s. Taken together with the growing sample of millimeter M dwarf flares, this event suggests that millimeter emission is actually common during stellar flares and often originates from short burst-like events.

Stellar activity↗

AU Microscopii in the Far-UV Observations in Quiescence, During Flares, and Implications for AU Mic b and c

High-energy X-ray and ultraviolet(UV)radiation from young stars impacts planetary atmospheric chemistry and mass loss. The active∼22 Myr M dwarf AU Mic hosts two exoplanets orbiting interior to its debris disk. Therefore, this system provides a unique opportunity to quantify the effects of stellar X-ray and UV irradiation on planetary atmospheres as a function of both age and orbital separation. In this paper, we present over 5 hr of far-UV (FUV)observations of AU Mic taken with the Cosmic Origins Spectrograph (COS; 1070-1360Å) on the Hubble Space Telescope (HST). We provide an itemization of 120 emission features in the HST/COS FUV spectrum and quantify the flux contributions from formation temperatures ranging from 104 to 107K. We detect 13 flares in the FUV white-light curve with energies ranging from 1029 to 1031erg s. The majority of the energy in each of these flares is released from the transition region between the chromosphere and the corona. There is a 100×increase influx at continuum wavelengths λ<1100 Å in each flare, which may be caused by thermal Bremsstrahlung emission. We calculate that the baseline atmospheric mass-loss rate for AU Mic b is∼108 g s−1, although this rate can be as high as∼1014 g s−1during flares with Lflare 10-33 erg s−1. Finally, we model the transmission spectra for AU Mic b and c with a new panchromatic spectrum of AU Mic and motivate future JWST observations of these planets.

Adina D Feinstein↗

New Insights Into Aristarchus Crater With LRO LAMP Far-Ultraviolet Observations

Aristarchus crater is a Copernican-age impact crater well known for its high-albedo ejecta blanket and nearby flow features rich in pyroclastic materials. The Lyman Alpha Mapping Project (LAMP) is a far-ultraviolet (FUV) spectrograph (57–197 nm) on board the Lunar Reconnaissance Orbiter (LRO). LAMP data identified Aristarchus crater as having a high Off-band (155–184 nm) to On-band (130–155 nm) albedo (Off/On) ratio, providing new insight into the mineral composition of the area. Previous LAMP observations of bright crater rays and lunar swirls show that regions of high Off/On-band ratios may indicate highly feldspathic compositions. In this study we use LAMP data to understand FUV compositional signatures at Aristarchus. We investigate four well-characterized regions of interest around Aristarchus crater, and we compare Off/On-band ratios at Aristarchus crater to laboratory-derived ratios of several endmembers such as anorthite and olivine. We further analyze LAMP FUV spectra alongside near-infrared spectra from the Moon Mineral Mapper (M3) on board Chandrayaan-1 to characterize the mineralogy in several regions of interest. We find that LAMP Off/On-band ratios are able to distinguish between plagioclase feldspars and minerals such as quartz and mafic-dominated compositions. The LAMP Off/On-band ratios at Aristarchus are higher than previously reported ratios for plagioclase-rich regions, suggesting that the composition is unique to Aristarchus. Spectra from LAMP and M 3 both show that the central peak and high-albedo ejecta around Aristarchus contain shocked, possibly alkalic, plagioclase feldspar.

Elizabeth Czajka↗

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗

Enhanced Far Ultra-Violet Optical Properties of Physical Vapor Deposited Aluminum Mirrors Through Fluorination

Astronomical instrumentation for measurements in the Far Ultra-Violet (FUV, 90-200 nm) typically use aluminum (Al) thin films due to their high reflectance over this wavelength range. However, the native aluminum oxide layer that forms on Al upon exposure to the atmosphere is strongly absorbing in this wavelength range, requiring that the films be protected with a dielectric that inhibits oxidation. Typically, magnesium fluoride (MgF 2 ) or lithium fluoride (LiF) coatings are used as protective layers, but each has shortcomings. For example, MgF 2 has an absorption cutoff at 115 nm reducing performance in a critical part of the FUV spectrum of observational interest. A viable option to access these lower wavelengths could be the use of the LiF overcoat as it has a lower absorption cutoff at 102.5 nm, but it is hygroscopic and thus susceptible to degradation in humid conditions. An approach to reduce the hygroscopic nature of LiF would be to implement a passivation process during the deposition of both Al+LiF coatings. Our team at GSFC has developed a new reactive Physical Vapor Deposition (rPVD) process that consists of a fluorination process with XeF 2 gas combined with our traditional PVD process. We have found that this new rPVD coating process offers a protected version of Al+LiF with a more environmentally stable and more transparent LiF layer, along with unprecedent reflectivity. The process starts with a bare optically smooth substrate that is coated with Al in an ultra-high vacuum (UHV) chamber by the conventional PVD process. Then, the bare Al mirror is immediately exposed to a reactive XeF 2 gas before and after the application of the flash PVD evaporated LiF layer. We have also been investigating the use of this rPVD coating process for potential efficiency enhancements of Si-based gratings. Since it is known that the XeF 2 vapor is a strong Si etchant, we are investigating if the native SiO 2 layer on Si is sufficient to protect the groove profile of e-beam-ruled Si gratings from degradation. We will report on the characterization of various Al+LiF witness mirror coatings (both on borosilicate and Si) performed under various deposition conditions using the XeF 2 passivation process. These tests include XPS to determine film stoichiometry and AFM/SEM to measure surface roughness and any etching on the Si substrate. We will also report on FUV reflectance and spectroscopic ellipsometry to characterize optical constants of these passivated films in the UV/Visible/NIR spectral ranges.

Engineering (General)↗

Far Ultraviolet Emission Cross Sections of Ne II and Ne III Excited by Electron Impact

In the electron-impact-induced fluorescence spectrum on neon in the wavelength range of 120 270 nm at a spectral resolution of 0.43 nm, the strongest lines in the far ultraviolet (FUV) spectrum of neon are assigned to items of the Doublet system of Ne II and the Triplet system of Ne III. FUV spectral data at 300 eV electron impact energy provide absolute emission cross sections of these Ne II and Ne III lines and are compared to previous measurements.

electron impact fluorescence spectrum neon Doublet↗

Exposure of Highly Reflective Far-Ultraviolet Coatings to LEO Environment for TRL Advancement for the Habitable Worlds Observatory

Over the past several years, our team at the NASA Goddard Space Flight Center (GSFC), in collaboration with the Jet Propulsion Laboratory (JPL) and the Naval Research Laboratory (NRL), have developed several new protected Al coating technologies with improved Far-Ultraviolet (FUV) reflectance performance and more robust environmental stability. These include Al protected with lithium-based fluoride (LiF) coatings such as hot deposited LiF (eLiF), XeF 2 -passivated LiF coatings (XeLiF), Li 3 AlF 6 overcoats, AlF 3 (plasma passivated), and XeF 2 passivated MgF 2 coatings (XeMgF 2 ). However, despite these developments, relatively little experimental information exists regarding the long-term stability of these coatings after simultaneous exposure to the Low Earth Orbit (LEO) environment. To evaluate their environmental durability and advance their Technology Readiness Level (TRL), representative samples of these coating technologies, Al+XeLiF, Al+eLiF, Al+Li 3 AlF 6 , Al+AlF 3 , Al+XeMgF 2 , and bare Al as reference samples, were flown onboard the International Space Station (ISS) as part of the Materials International Space Station Experiment 20 (MISSE-20). The MISSE platform is operated by Aegis Aerospace for relatively long-duration (e.g. 6 months) external exposure experiments in a space environment. The coatings were deposited on ULE and Zerodur substrates, and witness samples deposited on the same coatings runs, but on glass slides were left on Earth as control. A subset of the flight samples were fitted with MgF 2 windows to reduce direct exposure to atomic oxygen (AO) and charged particles, and still let through UV and other types of radiation on these samples. After approximately 6 months of exposure in the forward-facing (RAM) direction, the samples were returned to Earth and characterized by performing FUV/NUV/VIS/NIR reflectance measurements to quantify degradation, spectroscopic ellipsometry to evaluate coating thickness and optical constants, atomic force microscopy (AFM) to quantify surface roughness evolution during the flight in the ISS. The MgF 2 protective windows were also analyzed through FUV transmission measurements. Comparison with the witness samples left on the ground and with the flown bare Al samples (with just the naturally occurring Al 2 O 3 layer) provided a quantitative assessment of coating thickness variations, optical performance degradation, and morphological changes induced by prolonged exposure to the LEO environment.

Far Ultraviolet (FUV)↗

Quantum efficiency of opaque CsI photocathodes with channel electron multiplier arrays in the extreme and far ultraviolet

The arrays are overcoated with a CsI photocathode in the VUV. The measurements are part of the development program for the Extreme Ultraviolet Explorer. Monochromatic light from a hollow cathode discharge source passing through a McPherson grazing incidence monochromator is used to illuminate the CsI photocathode. The beam diameter is kept small (approximately 2 mm) to confine it within the individual thickness strips. A bias grid is used to produce a 50-V/mm electric field to guarantee collection of all photoelectrons emitted by the CEMA (channel electron multiplier array) webbing. The CEMAs are operated with a gain of 2-3 x 10 to the 6th and are moderately saturated. A channeltron secondary transfer standard is used to determine the absolute QE in the EUV, whereas an NBS calibrated windowed photodiode is used to measure the FUV absolute QE. It is noted that the CsI gives a factor of 3 increase in the QE in the EUV and a factor of 50-5000 in the FUV.

Martin, C.↗

Pre-main sequence stars

Observations of premain-sequence (PMS) stars obtained with the IUE satellite since its launch in 1978 are reviewed. The major types of PMS stars are listed and briefly characterized: T Tau stars, Herbig Ae stars, FU Ori objects, weak-emission PMS stars, and Herbig-Haro objects. The IUE data for a catalog of PMS objects are then presented in a table, graphs, and sample spectra and described in detail. Topics addressed include general spectral profiles, the Mg II h and k lines, the FUV emission lines, the UV continuum, and the impact of the IUE on astrophysical models of PMS stars. The need for observations with higher spectral resolution and much greater sensitivity is indicated, and the ability of the Hubble Space Telescope High-Resolution Spectrograph and the proposed NASA/ESA Lyman FUV Spectroscopic Explorer to meet these requirements is considered.

Imhoff, Catherine L.↗

Charge coupled devices vs. microchannel plates in the extreme and far ultraviolet - A comparison based on the latest laboratory measurements

While microchannel plates (MCPs) have been established as imaging photon counters in the EUV and FUV for some years, CCDs are associated with low light level sensing at visible and near-IR wavelengths. Attention is presently given to recent proposals for CCDs' use as EUV and FUV detectors with quantum efficiencies sometimes exceeding those of MCPs; quantum resolution, format size, dynamic range, and long-term stability are also used as bases of comparison, for the cases of both space-based astronomical and spectroscopic applications.

Vallerga, J.↗

Far ultraviolet wide field imaging and photometry - Spartan-202 Mark II Far Ultraviolet Camera

The U.S. Naval Research Laboratory' Mark II Far Ultraviolet Camera, which is expected to be a primary scientific instrument aboard the Spartan-202 Space Shuttle mission, is described. This camera is intended to obtain FUV wide-field imagery of stars and extended celestial objects, including diffuse nebulae and nearby galaxies. The observations will support the HST by providing FUV photometry of calibration objects. The Mark II camera is an electrographic Schmidt camera with an aperture of 15 cm, a focal length of 30.5 cm, and sensitivity in the 1230-1600 A wavelength range.

Carruthers, George R.↗

Far ultraviolet observations of hot DA white dwarfs

Far ultraviolet (FUV) fluxes have been used for determining the effective temperatures of a number of DA white dwarfs hotter than 20,000 K. The analysis consisted of comparing the observed FUV fluxes with model fluxes scaled to the V-band flux. After suitable corrections were performed for the time-dependent sensitivity degradation of the IUE, it was found that the available flux calibrations for the IUE were insufficiently accurate for precise temperature determinations. Accordingly, seven white dwarfs for which accurate, independent temperature determinations were made from line profile analyses were used to improve the accuracy of the IUE flux calibration. The correction to the original calibration was as great as 20 percent in individual 5-A wavelength bins, while the average over the IUE wavelength range was 5 percent. Both the IUE flux correction and the temperatures obtained for the hot white dwarfs are presented.

Finley, David↗

Long-term study of longitudinal dependence in primary particle precipitation in the north Jovian aurora

The wavelength-dependent absorption apparent in IUE spectra of the north Jovian aurora is analyzed to determine the column density of hydrocarbons above the altitude of the FUV auroral emission. Both the magnetotail and torus auroral zone models are considered in estimating zenith angles, with very similar results obtained for both models. It is found that the hydrocarbon column density above the FUV emission displays a consistent dependence on magnetic longitude, with the peak density occurring approximately coincident with the peak in the observed auroral intensity. Two distinct scenarios for the longitude dependence of the column density are discussed. In one, the Jovian upper atmosphere is longitudinally homogeneous, and the variation in optical depth is due to a variation in penetration, and thus energy, of the primary particles. In the other, the energy of the primaries is longitudinally homogeneous, and it is aeronomic properties which change, probably due to auroral heating.

Livengood, T. A.↗