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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 127 records · Page 7
All sourcesNASA NTRSDOE OSTI
NASA NTRS1981

Ion beam deposited protective films

Sputter deposition of adherent thin films on complex geometric surfaces by ion beam sources is examined in order to evaluate three different types of protective coatings for die materials. In the first experiment, a 30 cm diameter argon ion source was used to sputter deposit adherent metallic films up to eight microns thick on H-13 steel, and a thermal fatigue test specimen sputter deposited with metallic coatings one micron thick was immersed in liquid aluminum and cooled by water for 15,000 cycles to simulate operational environments. Results show that these materials do protect the steel by reducing thermal fatigue and thereby increasing die lifetime. The second experiment generated diamond-like carbon films using a dual beam ion source system that directed an eight cm argon ion source beam at the substrates. These films are still in the process of being evaluated for crystallinity, hardness and infrared absorption. The third experiment coated a fiber glass beam shield incorporated in the eight-cm diameter mercury ion thruster with molybdenum to ensure proper electrical and thermal properties. The coating maintained its integrity even under acceleration tests.

Mirtich, M. J.↗
NASA NTRS1984

Diffuse ions produced by electromagnetic ion beam instabilities

The evolution of the electromagnetic ion beam instability driven by the reflected ion component backstreaming away from the earth's bow shock into the foreshock region is studied by means of computer simulation. The linear and quasi-linear stages of the instability are found to be in good agreement with known results for the resonant mode propagating parallel to the beam along the magnetic field and with theory developed in this paper for the nonresonant mode, which propagates antiparallel to the beam direction. The quasi-linear stage, which produces large amplitude delta B approximately B, sinusoidal transverse waves and 'intermediate' ion distributions, is terminated by a nonlinear phase in which strongly nonlinear, compressive waves and 'diffuse' ion distributions are produced. Additional processes by which the diffuse ions are accelerated to observed high energies are not addressed. The results are discussed in terms of the ion distributions and hydromagnetic waves observed in the foreshock of the earth's bow shock and of interplanetary shocks.

Winske, D.↗
NASA NTRS1981

Ion beam microtexturing of surfaces

Some recent work in surface microtecturing by ion beam sputtering is described. The texturing is accomplished by deposition of an impurity onto a substrate while simultaneously bombarding it with an ion beam. A summary of the theory regarding surface diffusion of impurities and the initiation of cone formation is provided. A detailed experimental study of the time-development of individual sputter cones is described. A quasi-liquid coating was observed that apparently reduces the sputter rate of the body of a cone compared to the bulk material. Experimental measurements of surface diffusion activation energies are presented for a variety of substrate-seed combinations and range from about 0.3 eV to 1.2 eV. Observations of apparent crystal structure in sputter cones are discussed. Measurements of the critical temperature for cone formation are also given along with a correlation of critical temperature with substrate sputter rate.

Robinson, R. S.↗
NASA NTRS1982

Ion beam surface modification

The essential details of a study on the practical applications and mechanisms of polymer sputtering via Argon ion impact are summarized. The potential to modify the properties of polymer surfaces to improve their adherence, durability, biocompatibility, or other desirable properties by ion beam sputtering was emphasized. Ion beam milling can be of benefit as an analytical tool to obtain composition versus depth information. Ion impact from a directed ion gun source specifically etches polymer structures according to their morphologies, therefore this technique may be useful to study unknown or new morphological features. Factors addressed were related to: (1) the texture that arises on a polymer target after ion impact; (2) the chemistry of the top surface after ion impact; (3) the chemistry of sputtered films of polymeric material deposited on substrates placed adjacent to targets during ion impact; and (4) practical properties of textured polymer targets, specifically the wettability and adhesive bonding properties.

Dwight, D. W.↗
NASA NTRS2013

Ion Beam Deflection (AKA Push-Me/Pull-You)

The Ion Beam Deflection provides the following potential advantages over other asteroid deflection systems. Like the gravity tractor, it doesn't require despinning of the asteroid. Unlike the gravity tractor, it provides a significantly higher coupling force that is independent of the asteroid size. The concept could be tested as part of the baseline Asteroid Redirect Robotic Mission. The thrust and total impulse are entirely within the design of the SEP vehicle. The total impulse is potentially competitive with kinetic impactors and eliminates the need for a second rendezvous spacecraft.Gridded ion thrusters provide beam divergence angles of a few degrees enabling long stand-off distances from the asteroid. Mitigating control issues. Minimizing back-sputter contamination risks

high-power, low-beam-divergence ion thruster (NEXI↗
NASA NTRS2017

Characteristics of a high-power ion beam deflection system necessary to deflect the hypothetical asteroid 2017 PD

The July 2027 impact date for the hypothetical asteroid 2017 PDC, that is the subject of an emergency response exercise, leaves just over ten years to implement a deflection approach. The analyses herein allocates four years to the design, fabrication, assembly, test and launch of a notional high-power Ion Beam Deflection (IBD) vehicle to meet a launch readiness date no later than May 2021. Using this launch date along with estimates for the vehicle mass and performance characteristics of the electric propulsion system, low-thrust trajectory analyses indicate a 2.56-year flight time to rendezvous with 2017 PDC. This would leave 3.6 years to execute the actual deflection phase. A 160-kW IBD vehicle could deflect 2017 PDC by at least one Earth radius within this time provided the asteroid’s actual diameter was less than about 140 m and its density was 2 g/cm3 or less. Larger diameters and/or higher densities would require a higher power IBD vehicle, multiple IBD vehicles, or a longer deflection phase. Ion beam deflection is largely independent of the characteristics of the threat object, but its effectiveness, like all deflection approaches, is sensitive to both the asteroid mass and the time available for deflection. The characteristics of IBD, i.e., large standoff distance between the spacecraft and the asteroid surface, as well as ion beam divergence angles of a few degrees, facilitates the possible simultaneous use of multiple IBD vehicles to improve the performance and robustness of the asteroid deflection. The 65-cm diameter, 20-kW NEXIS ion thruster developed in support of the Jupiter Icy Moons Orbiter mission concept is particularly well suited for application to a high-power IBD system. It has demonstrated an ion beam divergence angle of approximately 2 degrees and operation at 20 kW for over 2,000 hours. Completion of the development and flight qualification of this technology would significantly reduce the risk and time necessary to respond to the discovery of potentially hazardous asteroid in the size range of 50- to 100-m diameter.

Reeves, David↗
NASA NTRS1993

Optical and Scratch Resistant Properties of Diamondlike Carbon Films Deposited with Single and Dual Ion Beams

Amorphous diamond-like carbon (DLC) films were deposited using both single and dual ion beam techniques utilizing filament and hollow cathode ion sources. Continuous DLC films up to 3000 A thick were deposited on fused quartz plates. Ion beam process parameters were varied in an effort to create hard, clear films. Total DLC film absorption over visible wavelengths was obtained using a Perkin-Elmer spectrophotometer. An ellipsometer, with an Ar-He laser (wavelength 6328 A) was used to determine index of refraction for the DLC films. Scratch resistance, frictional, and adherence properties were determined for select films. Applications for these films range from military to the ophthalmic industries.

Kussmaul, Michael T.↗
NASA NTRS1992

Ion beam treatment of potential space materials at the NASA Lewis Research Center

Ion source systems in different configurations, have been used to generate unique morphologies for several NASA space applications. The discharge chamber of a 30 cm ion source was successfully used to texture potential space radiator materials for the purpose of obtaining values of thermal emittance greater than 0.85 at 700 and 900 K. High absorptance surfaces were obtained using ion beam seed texturing, for space radiator materials that were flown on the Long Duration Exposure Facility (LDEF) for 5.8 years in space. An ion source discharge chamber was also used to develop electrode surfaces with suppressed secondary electron emission characteristics for use in collectors in microwave amplifier traveling wave tubes. This was accomplished by sputtering textured carbon onto copper as well as texturing copper using tantalum and molybdenum as sacrificial texture inducing seeding materials. In a third configuration, a dual ion beam system was used to generate high transmittance diamondlike carbon (DLC) films.

Kussmaul, Michael↗
NASA NTRS1991

Ion beam textured and coated surfaces experiment (IBEX)

The IBEX, with 36 samples of various materials, was placed aboard the LDEF. Twenty-seven of the samples had surfaces modified using ion beam technology, and nine were made up of commercially available materials. The materials are in some way useful in space power systems. The various types of materials tested included six categories: (1) ion beam structured surfaces suitable for solar thermal (concentrator) or space radiators; (2) ion beam sputtered conductive coatings for thermal and space charge control; (3) solar reflector surfaces; (4) flexible thin film coatings and solar array blanket material for protection of spacecraft polymers; (5) painted and/or state-of-the-art solar thermal materials; and (6) micrometeoroid sensitive detector. Data analysis presented include the optical properties of each surface before and after exposure to the space environment and the respective backup surfaces.

Mirtich, Michael J.↗
NASA NTRS1979

Ion-beam texturing of materials

Xenon ion-beam source is used to create microscopically-rough surface texture by sputter-etching surface while simultaneously sputter depositing lower yield material onto surface.

Hudson, W. R.↗
NASA NTRS1982

Ion Beam Sputtered Coatings of Bioglass

The ion beam sputtering technique available at the NASA-Lewis was used to apply coatings of bioglass to ceramic, metallic, and polymeric substrates. Experiments in vivo and in vitro described investigate these coatings. Some degree of substrate masking was obtained in all samples although stability and reactivity equivalent to bulk bioglass was not observed in all coated samples. Some degree of stability was seen in all coated samples that were reacted in vitro. Both metallic and ceramic substrates coated in this manner failed to show significantly improved coatings over those obtained with existing techniques. Implantation of the coated ceramic substrate samples in bone gave no definite bonding as seen with bulk glass; however, partial and patchy bonding was seen. Polymeric substrates in these studies showed promise of success. The coatings applied were sufficient to mask the underlying reactive test surface and tissue adhesion of collagen to bioglass was seen. Hydrophilic, hydrophobic, charged, and uncharged polymeric surfaces were successfully coated.

Hench, Larry L.↗
DOE OSTI2026

New Directions in Focused Ion Beam Induced Deposition for the Nanoprinting of Functional 3D Heterostructures

The focused ion beam (FIB) microscope is well established as a high-resolution machining instrument capable of site-selectively removing material down to the nanoscale. Beyond subtractive processing, however, the FIB can also add material via a technique known as focused ion beam induced deposition (FIBID). Using FIBID, the FIB can thus be employed for the direct-write of complex nanostructures. This work explores new directions in three-dimensional FIBID nanoprinting, harnessing unique features of helium and neon FIBs. In particular, the superior spatial resolution of these novel FIBs is leveraged to fabricate precise multimaterial architectures, an isotope effect is used to create satellite deposits, and dose-controlled implantation of the gaseous ions is used to engineer internal voids. In the context of voids, the fabrication of hollow nanopillars by helium-FIBID due to concurrent milling (as shown previously by others) is revisited. Insight into the chemical and structural composition of the nanostructures is obtained using advanced electron microscopy, accurately revealing buried interfaces, crystallite distributions, chemical compositions, and material transformations. Next-generation devices and technologies that could be enabled by the novel heterostructures demonstrated here are discussed, setting the stage for the potential evolution of FIBID into a versatile platform for functional nanomaterials design and fabrication.

FIBID↗
NASA NTRS2005

Making AlN(x) Tunnel Barriers Using a Low-Energy Nitrogen-Ion Beam

A technique based on accelerating positive nitrogen ions onto an aluminum layer has been demonstrated to be effective in forming thin (<2 nm thick) layers of aluminum nitride (AlN(x)) for use as tunnel barriers in Nb/Al-AlN(x)/Nb superconductor/insulator/ superconductor (SIS) Josephson junctions. AlN(x) is the present material of choice for tunnel barriers because, to a degree greater than that of any other suitable material, it offers the required combination of low leakage current at high current density and greater thermal stability. While ultra-thin AlN films with good thickness and stoichiometry control are easily formed using techniques such as reactive molecular beam epitaxy and chemical vapor deposition, growth temperatures of 900 C are necessary for the dissociative adsorption of nitrogen from either nitrogen (N2) or ammonia (NH3). These growth temperatures are prohibitively high for the formation of tunnel barriers on Nb films because interfacial reactions at temperatures as low as 200 to 300 C degrade device properties. Heretofore, deposition by reactive sputtering and nitridation of thin Al layers with DC and RF nitrogen plasmas have been successfully used to form AlN barriers in SIS junctions. However, precise control over critical current density Jc has proven to be a challenge, as is attaining adequate process reproducibility from system to system. The present ion-beam technique is an alternative to the plasma or reactive sputtering techniques as it provides a highly controlled arrival of reactive species, independent of the electrical conditions of the substrate or vacuum chamber. Independent and accurate control of parameters such as ion energy, flux, species, and direction promises more precise control of film characteristics such as stoichiometry and thickness than is the case with typical plasma processes. In particular, the background pressure during ion-beam nitride growth is 2 or 3 orders of magnitude lower, minimizing the formation of compounds with contaminants, which is critical in devices the performance of which is dictated by interfacial characteristics. In addition, the flux of incoming species can be measured in situ using ion probes so that the dose can be controlled accurately. The apparatus used in the present ion-beam technique includes a vacuum chamber containing a commercial collimated- ion-beam source, a supply of nitrogen and argon, and an ion probe for measuring the ion dose. Either argon or nitrogen can be used as the feed gases for the ion source, depending on whether cleaning of the substrate or growth of the nitride, respectively, is desired. Once the Nb base electrode and Al proximity layer have been deposited, the N2 gas line to the ion beam is vented and purged, and the ion-source is turned on until a stable discharge is obtained. The substrate is moved over the ion-beam source to expose the Al surface layer to the ion beam (see figure) for a specified duration for the formation of the nitride tunnel barrier. Next, the Nb counter-electrode layer is deposited on the nitride surface layer. The Nb/Al- AlN(x)/Nb-trilayer-covered substrate is then patterned into individual devices by use of conventional integrated-circuit processing techniques.

Kaul, Anupama↗
NASA NTRS1987

ITO/InP solar cells: A comparison of devices fabricated by ion beam and RF sputtering of the ITO

This work was performed with the view of elucidating the behavior of indium tin oxide/indium phosphide (ITO/InP) solar cells prepared by RF and ion beam sputtering. It was found that using RF sputter deposition of the ITO always leads to more efficient devices than ion beam sputter deposition. An important aspect of the former technique is the exposure of the single crystal p-InP substrates to a very low plasma power prior to deposition. Substrates treated in this manner have also been used for ion beam deposition of ITO. In this case the cells behave very similarly to the RF deposited cells, thus suggesting that the lower power plasma exposure (LPPE) is the crucial process step.

Coutts, T. J.↗