Search NASA⌕ Search

SEARCH · Search NASA

Results for “sputter deposition”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

Quote a phrase for an exact phrase match. Source license links do not imply unrestricted reuse.

At least 145 records · Page 8
All sourcesNASA NTRSDOE OSTI
NASA NTRS2005

High-Temperature, Thin-Film Strain Gages Improved

Conventional resistance strain gage technology uses "bonded" strain gages. These foil or wire gages are bonded onto the surface of the test article with glue, ceramic cements, or flame-sprayed ceramics. These bonding agents can, in some instances, limit both the degree of strain transmission from the test structure to the gage and the maximum working temperature of the gage. Also, the bulky, bonded gage normally disrupts aerodynamic gas flow on the surface of the test structure because of its intrusive character. To respond to the urgent needs in aeronautic and aerospace research where stress and temperature gradients are high, aerodynamic effects need to be minimized, and higher operational temperatures are required, the NASA Lewis Research Center developed a thin film strain gage. This gage, a vacuum-deposited thin film formed directly on the surface of a test structure, operates at much higher temperatures than commercially available gages do and with minimal disruption of the aerodynamic flow. The gage uses an alloy, palladium-13 wt % chromium (hereafter, PdCr), which was developed by United Technologies Research Center under a NASA contract. PdCr is structurally stable and oxidation resistant up to at least 1100 C (2000 F); its temperature-induced resistance change is linear, repeatable, and not sensitive to the rates of heating and cooling. An early strain gage, which was made of 25-micrometer-diameter PdCr wire and demonstrated to be useable to 800 C, won an R&D 100 award in 1991. By further improving the purity of the material and by developing gage fabrication techniques that use sputter-deposition, photolithography patterning, and chemical etching, we have made an 8- to 10-m PdCr thin-film strain gage that can measure dynamic and static strain to at least 1100 C. For static strain measurements, a 5-m-thick Pt element serves as a temperature compensator to further minimize the temperature effect of the gage. These thin-film gages provide the advantage of minimally intrusive surface strain measurements and give highly repeatable readings with low drift at temperatures from ambient to 1100 C. This is a 300 C advance in operating temperature over the PdCr wire gage and a 500 C advance over commercially available gages made of other materials.

Source record↗
NASA NTRS1973

In situ sputter cleaning of thin film metal substrates for UHV-TEM corrosion studies.

A prerequisite for conducting valid corrosion experiments by in situ electron microscopy techniques is not only the achievement of UHV background pressure conditions at the site of the specimen but also the ability to clean the surface of the thin metal substrate specimen before initiation of the corrosive interaction. A miniaturized simple ion gun has been constructed for this purpose. The gun is small enough to be incorporated into an UHV electron microscope specimen chamber with hot stage in such a way as to permit bombardment of the substrate specimen while observing it by transmission electron microscopy TEM. It is shown that the ion beam generated is confined well enough to cause a sputtering removal of substrate material at a rate of approximately 5-10 A/min and to prevent the sputter deposition of contaminating material from the specimen holder.

Heinemann, K.↗
NASA NTRS1973

Darkening of silicate rock powders by solar wind sputtering.

Hydrogen ion irradiation of powdered igneous rocks, including Apollo rocks, has been observed in the laboratory to darken the powders and to make their optical properties similar to the moon's. An extensive series of investigations shows that this darkening is not spurious. These results are consistent with those of other investigators, including Nash (1967). Darkening of lunar igneous rock powders by the formation of solar wind-sputtered glass films is a real process which occurs on the moon. The time scale for darkening of undisturbed lunar soil is of the order of 50,000-100,000 yr. Comparison of the rates of the formation of glasses on the lunar surface by solar wind sputter-deposition, meteorite impact melting, and impact vaporization-deposition indicates that these processes are of comparable importance under the present flux of meteorites.

Hapke, B.↗
NASA NTRS1974

Studies related to the surfaces of the moon and planets

A variety of glasses of lunar composition were prepared with different amounts of Fe and Ti under both reducing and oxidizing conditions, and also by sputter-deposition and thermal evaporation and condensation. These materials were analyzed by wet chemical, electron microprobe, ESR, Mossbauer and magnetic methods. The effects of darkening processes on surface soils of airless bodies are discussed along with the effects of vapor phase deposition processes on the optical, chemical, and magnetic properties of the lunar regolith.

Hapke, B.↗
NASA NTRS1975

Effects of dc bias on the fabrication of amorphous GdCo RF sputtered films

An investigation has been conducted on the effects of a dc bias field applied to Gd(1-x)Co(x) thin films during RF sputter deposition. Such films may possess uniaxial magnetic anisotropy with easy axis perpendicular to the plane of the film and may be used in magnetic bubble devices. Uniformity in composition, thickness and magnetic properties has been achieved and film composition has been controlled to within one percent. However, significant variations of magnetic properties were observed from film to film.

Bourne, H. C., Jr.↗
NASA NTRS1975

Cadmium stannate selective optical films for solar energy applications

Efforts concentrated on reducing the electrical sheet resistance of sputtered cadmium stannate films, installing and testing equipment for spray coating experiments, and sputter deposition of thin cadmium sulfide layers onto cadmium stannate electrodes. In addition, single crystal silicon wafers were coated with cadmium stannate. Work also continued on the development of the backwall CdS solar cell.

Haacke, G.↗
NASA NTRS1976

Adhesion and friction of thin metal films

Sliding friction experiments were conducted in vacuum with thin films of titanium, chromium, iron, and platinum sputter deposited on quartz or mica substrates. A single crystal hemispherically tipped gold slider was used in contact with the films at loads of 1.0 to 30.0 and at a sliding velocity of 0.7 mm/min at 23 C. Test results indicate that the friction coefficient is dependent on the adhesion of two interfaces, that between the film and its substrate and the slider and the film. There exists a relationship between the percent d bond character of metals in bulk and in thin film form and the friction coefficient. Oxygen can increase adhesive bonding of a metal film (platinum) to a substrate.

Buckley, D. H.↗
NASA NTRS1976

Magnetoresistance and noise properties of chevron stretcher detectors for field access bubble domain devices

Experiments were devised to study the angular variation of the resistance and noise properties of one- and two-level chevron stretcher magnetoresistive detectors for use in field access bubble memory devices. All measurements, made with an electronic system, were performed on glass or garnet samples upon which 1 micron of SiO2 was sputter-deposited, followed by 4000 A of Permalloy for the 28-micron-period devices and 0.8 microns of SiO2, followed by 3000 A of Permalloy for the 20-micron-period devices. The geometrical and drive-state dependence of the zero-state noise were studied, as was its frequency dependence. It is found that both types of detectors operate primarily in the amplitude-shift mode for drive fields of interest and that the presence of a bubble in a detector causes a magnetoresistance change equal to that produced by increasing the in-plane drive field about 8 Oe in the absence of a bubble.

George, P. K.↗
NASA NTRS1977

Optical properties of ion beam textured metals

Copper, silicon, aluminum, titanium and 316 stainless steel were textured by 1000 eV xenon ions from an 8 cm diameter electron bombardment ion source. Simultaneously sputter-deposited tantalum was used to facilitate the development of the surface microstructure. Scanning electron microscopy of the ion textured surfaces revealed two types of microstructure. Copper, silicon, and aluminum developed a cone structure with an average peak-to-peak distance ranging from 1 micron for silicon to 6 microns for aluminum. Titanium and 316 stainless steel developed a serpentine ridge structure. The average peak-to-peak distance for both of these materials was 0.5 micron. Spectral reflectance was measured using an integrating sphere and a holraum reflectometer. Total reflectance for air mass 0 and 2, solar absorptance and total emittance normalized for a 425 K black body were calculated from the reflectance measurements.

Hudson, W. R.↗
NASA NTRS1977

Ion-beam technology and applications

Ion propulsion research and development yields a mature technology that is transferable to a wide range of nonpropulsive applications, including terrestrial and space manufacturing. A xenon ion source was used for an investigation into potential ion-beam applications. The results of cathode tests and discharge-chamber experiments are presented. A series of experiments encompassing a wide range of potential applications is discussed. Two types of processes, sputter deposition, and erosion were studied. Some of the potential applications are thin-film Teflon capacitor fabrication, lubrication applications, ion-beam cleaning and polishing, and surface texturing.

Hudson, W. R.↗
NASA NTRS1977

Process for preparing liquid metal electrical contact device

The parts of an electrical contact device are treated by sputter etching to remove the parent metal oxide. Prior to exposure of the electrodes to any oxygen, a sacrificial metal is sputter deposited on the parts. Preferably this sacrificial metal is one that oxidizes slowly and is readily dissolved by the liquid metal. The sacrificial metal may then be removed from unwanted areas. The remainder of the ring and the probe to be wet by the liquid metal are submerged in the liquid metal or the liquid metal is flushed over these areas, preferably while they are being slightly abraded, unitl all the sacrificial material on these portions is wet by the liquid metal. In doing so the liquid metal dissolves the sacrificial metal and permanently wets the parent metal. Preferred materials used in the process and for the electrodes of electrical contact devices are high purity (99.0%) nickel or AISI type 304 stainless steel for the electrical contact devices, gallium as the liquid metal, and gold as the sacrificial material.

Lovell, R. R.↗
NASA NTRS1977

Space processing applications of ion beam technology

Ion thruster engines for spacecraft propulsion can serve as ion beam sources for potential space processing applications. The advantages of space vacuum environments and the possible gravity effects on thruster ion beam materials operations such as thin film growth, ion milling, and surface texturing were investigated. The direct gravity effect on sputter deposition and vapor deposition processes are discussed as well as techniques for cold and warm welding.

Grodzka, P. G.↗
NASA NTRS1979

Ion-beam texturing of materials

Xenon ion-beam source is used to create microscopically-rough surface texture by sputter-etching surface while simultaneously sputter depositing lower yield material onto surface.

Hudson, W. R.↗
NASA NTRS1978

Principles of ESCA and application to metal corrosion, coating and lubrication

The principles of ESCA (electron spectroscopy for chemical analysis) were described by comparison with other spectroscopic techniques. The advantages and disadvantages of ESCA as compared to other surface sensitive analytical techniques were evaluated. The use of ESCA was illustrated by actual applications to oxidation of steel and Rene 41, the chemistry of lubricant additives on steel, and the composition of sputter deposited hard coatings. A bibliography of material that was useful for further study of ESCA was presented and commented upon.

Wheeler, D. R.↗
NASA NTRS1978

Principles of ESCA and applications to metal corrosion, coating and lubrication

The principles of ESCA (electron spectroscopy for chemical analysis) are described by comparison with other spectroscopic techniques. The advantages and disadvantages of ESCA as compared to other surface sensitive analytical techniques are evaluated. The use of ESCA is illustrated by actual applications to oxidation of steel and Rene 41, the chemistry of lubricant additives on steel, and the composition of sputter deposited hard coatings. Finally, a bibliography of material that is useful for further study of ESCA is presented and commented upon.

Wheeler, D. R.↗
NASA NTRS1978

Technology of ion beam sources used in sputtering

The technology of broad-beam ion sources is reviewed from the viewpoint of the sputtering-deposition user. This review includes a short description of the development of discharge chambers, accelerator systems, and cathodes; the present alternatives for these components and the expected future improvements.

Kaufman, H. R.↗
NASA NTRS1980

Photonitride passivating coating for IC's

Increased reliability and simplified fabrication result from postassembly preencapsulation passivation process. Photonitride reaction chamber receives silane, ammonia, and mercury from mixing manifold to form passivating coating on IC's. Photonitride layer is barrier to moisture and penetration by mobile ions, and helps to protect IC devices subjected to severe mechanical handling or circuit repair procedures. Process is compatible with variety of wire-bonded lead frame assemblies. Advantages over plasma and sputtering deposition processes are low deposition temperature and zero stray radiation and ion levels.

Hall, T. C.↗