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Results for “Ion beam figuring”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2023

Nanometer flat blazed x-ray gratings using ion beam figure correction

With the development of nanometer accuracy stitching interferometry, ion beam figuring (IBF) of x-ray mirrors can now be achieved with unprecedented performance. However, the process of producing x-ray diffraction gratings on these surfaces may degrade the figure quality due to process errors introduced during the ruling of the grating grooves. To address this challenge, we have investigated the post-production correction of gratings using IBF, where stitching interferometry is used to provide in-process feedback. A concern with ion beam correction in this case is that ions will induce enough surface mobility of atoms to cause smoothing of the grating structure and degradation of diffraction efficiency. In this study we found however that it is possible to achieve a nanometer-level planarity of the global grating surface with IBF, while preserving the grating structure. The preservation was so good, that we could not detect a change in the diffraction efficiency after ion beam correction. This is of major importance in achieving ultra-high spectral resolution, and the preservation of brightness for coherent x-ray beams.

36 MATERIALS SCIENCE↗
DOE OSTI2023

Ion Beam Figuring System for Synchrotron X-Ray Mirrors Achieving Sub-0.2-µrad and Sub-0.5-nm Root Mean Square

Abstract Optics with high-precision height and slope are increasingly desired in numerous industrial fields. For instance, Kirkpatrick–Baez (KB) mirrors play an important role in synchrotron X-ray applications. A KB system is composed of two aspherical, grazing-incidence mirrors used to focus an X-ray beam. The fabrication of KB mirrors is challenging due to the aspherical departure of the mirror surfaces from base geometries and the high-quality requirements for slope and height residuals. In this paper, we present the process of manufacturing an elliptical cylinder KB mirror using our in-house-developed ion beam figuring (IBF) and metrology technologies. First, the key aspects of figuring and finishing processes with IBF are illustrated in detail. The effect of positioning error on the convergence of the residual slope error is highlighted and compensated. Finally, inspection and cross-validation using different metrology instruments are performed and used as the final validation of the mirror. Results confirm that relative to the requested off-axis ellipse, the mirror has achieved 0.15-µrad root mean square (RMS) and 0.36-nm RMS residual slope and height errors, respectively, while maintaining the initial 0.3-nm RMS microroughness.

36 MATERIALS SCIENCE↗
DOE OSTI2020

RIFTA: A Robust Iterative Fourier Transform-based dwell time Algorithm for ultra-precision ion beam figuring of synchrotron mirrors

With the rapid evolution of synchrotron X-ray sources, the demand for high-precision X-ray mirrors has greatly increased. Single nanometer profile error is required to keep imaging capability at the diffraction limit. Ion Beam Figuring (IBF), as a highly deterministic surfacing technique, has been used for ultra-precision finishing of mirrors. One crucial step that guides the IBF process is dwell time calculation. A valid dwell time solution should be non-negative and duplicate the shape of the desired removal map. Another important aspect is to minimize the total dwell time. In this study, we propose a Robust Iterative Fourier Transform-based dwell time Algorithm (RIFTA) that automatically fulfills these requirements. First, the thresholded inverse filtering in Fourier transform-based deconvolution is stabilized and automated by optimizing the threshold value using the Nelder-Mead simplex algorithm. Second, a novel two-level iterative scheme is proposed to guarantee the minimized total dwell time with its non-negativity at each dwell point. Third, a bicubic resampling is employed to flexibly adapt the calculated dwell time map to any IBF process intervals. The performance of RIFTA is first studied with simulation, followed by a comparison with the other state-of-the-art dwell time algorithms. We then demonstrate with an experiment that, using the dwell time calculated by the RIFTA, the total dwell time is shortened by a factor of two and the RMS in a 5 × 50 mm clear aperture was reduced from 3.4 nm to 1.1 nm after one IBF run, which proves the effectiveness and the efficiency of the proposed algorithm.

42 ENGINEERING↗
DOE OSTI2020

Development of a position–velocity–time-modulated two-dimensional ion beam figuring system for synchrotron x-ray mirror fabrication

With the rapid evolution of synchrotron x-ray sources, the demand for high-quality precision x-ray mirrors has greatly increased. Single nanometer shape accuracy is required to keep imaging capabilities at the diffraction limit. Ion beam figuring (IBF) has been used frequently for ultra-precision finishing of mirrors, but achieving the ultimate accuracy depends on three important points: careful alignment, accurate dwell time calculation and implementation, and accurate optical metrology. The Optical Metrology Group at National Synchrotron Light Source II has designed and built a position–velocity–time-modulated two-dimensional IBF system (PVT-IBF) with three novel characteristics: (1) a beam footprint on the mirror was used as a reference to align the coordinate systems between the metrology and the IBF hardware; (2) the robust iterative Fourier transform-based dwell time algorithm proposed by our group was applied to obtain an accurate dwell time map; and (3) the dwell time was then transformed to velocities and implemented with the PVT motion scheme. In this study, the technical aspects of the PVT-IBF systems are described in detail, followed by an experimental demonstration of the figuring results. In our first experiment, the 2D RMS in a 50mm×5mm clear aperture was reduced from 3.4 to 1.1 nm after one IBF run. In our second experiment, due to a 5 mm pinhole installed in front of the source, the 2D RMS in a 50mm×5mm clear aperture was reduced from 39.1 to 1.9 nm after three IBF runs, demonstrating that our PVT-IBF solution is an effective and deterministic figuring process.

47 OTHER INSTRUMENTATION↗
NASA NTRS1997

Ion Figuring of Replicated X-Ray Optics

This investigation included experiments to demonstrate ion beam figuring effects on electroless nickel with the expressed desire to figure X-ray optic mandrels. It was important to establish that ion beam figuring did not induce any adverse effects to the nickel surface. The ion beam has consistently been shown to be an excellent indicator of the quality of the subsurface. Polishing is not the only cause for failure in the ion beam final figuring process, the material composition is equally important. Only by careful consideration of both these factors can the ion beam final figuring process achieve its greatest potential. The secondary goal was to construct a model for representing the ion beam material removal rate. Representing the ion beam removal rate is only an approximation and has a number of limiting factors. The resolution of the metrology apparatus limits the modeling of the beam function as well. As the surface error corrections demand more precision in the final figuring, the model representing beam function must be equally precise. The precision to which the beam function can be represented is not only determined by the model but also by the measurements producing that model. The method developed for determining the beam function has broad application to any material destined to be ion beam figured.

Cantey, Thomas M.↗
DOE OSTI2023

Hybrid height and slope figuring method for grazing-incidence reflective optics

Grazing-incidence reflective optics are commonly used in synchrotron radiation and free-electron laser facilities to transport and focus the emitted X-ray beams. To preserve the imaging capability at the diffraction limit, the fabrication of these optics requires precise control of both the residual height and slope errors. However, all the surface figuring methods are height based, lacking the explicit control of surface slopes. Although our preliminary work demonstrated a one-dimensional (1D) slope-based figuring model, its 2D extension is not straightforward. In this study, a novel 2D slope-based figuring method is proposed, which employs an alternating objective optimization on the slopes in the x - and y -directions directly. An analytical simulation revealed that the slope-based method achieved smaller residual slope errors than the height-based method, while the height-based method achieved smaller residual height errors than the slope-based method. Therefore, a hybrid height and slope figuring method was proposed to further enable explicit control of both the height and slopes according to the final mirror specifications. An experiment to finish an elliptical-cylindrical mirror using the hybrid method with ion beam figuring was then performed. Both the residual height and slope errors converged below the specified threshold values, which verified the feasibility and effectiveness of the proposed ideas.

36 MATERIALS SCIENCE↗
DOE OSTI2023

Computer-controlled finishing via dynamically constraint position-velocity-time scheduler

In a Computer Numerical Controlled (CNC) finishing process, the target material removal from an optical surface is guided by the convolution between the influence function of a machine tool and its dwell time at certain points over the surface. To reduce dynamics stressing and increase machining efficiency, the dwell time must be converted to varying velocities, which are the actual inputs to the machine tool controller. Conventionally, the conversion assumed constant acceleration and relied on linear motion interpolation, which caused discontinuities in velocities. This unsmooth motion affects the material removal distribution, and, thus, the accuracy of the finished surface shape. Many modern CNC machines support the smoother, cubic-polynomial interpolated Position-Velocity-Time (PVT) motion mode; however, the conventional scheduler may fail to provide suitable velocities for the PVT. Here in this study answers this challenge by proposing a novel PVT-based velocity scheduler that achieves smooth motion while considering CNC dynamic limits. Firstly, the principle of the PVT is explained, and the PVT-based velocity scheduler is formulated. Secondly, a quadratic programming is used to optimize the velocities by imposing the CNC dynamic constraints and the C 1 continuities (zeroth and first derivatives are continuous) simultaneously. Thirdly, the smoothness and accuracy of the scheduled velocities are studied on different kinds of tool paths via simulation. Finally, a sub-0.3 nm level surface finishing experiment using ion beam figuring is demonstrated to verify the feasibility of the proposed method. The PVT-based scheduler and simulator code is open-sourced.

36 MATERIALS SCIENCE↗
DOE OSTI2026

Optimized manufacturing process for multilayer two-dimensional focusing mirrors in laboratory X-ray applications

Recent advances in laboratory X-ray applications require high-performance optical components that achieve exceptional imaging resolution and beam uniformity within compact experimental setups. Montel mirrors have become a preferred solution due to their unique dual-reflection focusing mechanism and a space-efficient design. Here, in this study, we present an effective manufacturing process for producing Montel mirrors tailored to focus laboratory X-ray beams. The mirrors were fabricated from single-crystal silicon substrates, chosen for their high mechanical stability and compatibility with precision polishing techniques. Our approach begins with the integration of a deterministic chemo-mechanical polishing (CMP)-based pre-shaping step followed by ion beam figuring (IBF), significantly improving manufacturing efficiency. Subsequently, our custom-developed advanced metrology and IBF techniques were employed for fabricating an off-axis, elliptical cylinder Montel mirror system with a 6-mrad total slope, with stringent optical specifications. While post-IBF processes, including multilayer coating, dicing, and gluing, introduced minor surface errors, yet their impact on performance remained negligible. The Montel mirrors manufactured with the optimized process exhibited significantly improved beam uniformity and a reduced focal spot size. These findings validate our approach as a viable solution for high-precision Montel mirror fabrication and facilitate further advancements in laboratory X-ray applications.

36 MATERIALS SCIENCE↗
DOE OSTI2021

RISE: robust iterative surface extension for sub-nanometer X-ray mirror fabrication

Precision optics have been widely required in many advanced technological applications. X-ray mirrors, as an example, serve as the key optical components at synchrotron radiation and free electron laser facilities. They are rectangular silicon or glass substrates where a rectangular Clear Aperture (CA) needs to be polished to sub-nanometer Root Mean Squared (RMS) to keep the imaging capability of the incoming X-ray wavefront at the diffraction limit. The convolutional polishing model requires a CA to be extended with extra data, from which the dwell time is calculated via deconvolution. However, since deconvolution is very sensitive to boundary errors and noise, the existing surface extension methods can hardly fulfill the sub-nanometer requirement. On one hand, the figure errors in a CA were improperly modeled during the extension, leading to continuity issues along the boundary. On the other hand, uncorrectable high-frequency errors and noise were also extended. In this study, we propose a novel Robust Iterative Surface Extension (RISE) method that resolves these problems with a data fitting strategy. RISE models the figure errors in a CA with orthogonal polynomials and ensures that only correctable errors are fit and extended. Combined with boundary conditions, an iterative refinement of dwell time is then proposed to compensate the errors brought by the extension and deconvolution, which drastically reduces the estimated figure error residuals in a CA while the increase of total dwell time is negligible. To our best knowledge, RISE is the first data fitting-based surface extension method and is the first to optimize dwell time based on iterative extension. An experimental verification of RISE is given by fabricating two elliptic cylinders (10 mm × 80 mm CAs) starting from a sphere with a radius of curvature around 173 m using ion beam figuring. The figure errors in the two CAs greatly improved from 204.96 nm RMS and 190.28 nm RMS to 0.62 nm RMS and 0.71 nm RMS, respectively, which proves that RISE is an effective method for sub-nanometer level X-ray mirror fabrication.

36 MATERIALS SCIENCE↗
DOE OSTI2022

Generalized large optics fabrication multiplexing

High precision astronomical optics are manufactured through deterministic computer controlled optical surfacing processes, such as subaperture small tool polishing, magnetorheological finishing, bonnet tool polishing, and ion beam figuring. Due to the small tool size and the corresponding tool influence function, large optics fabrication is a highly time-consuming process. The framework of multiplexed figuring runs for the simultaneous use of two or more tools is presented. This multiplexing process increases the manufacturing efficiency and reduces the overall cost using parallelized subaperture tools.

36 MATERIALS SCIENCE↗
DOE OSTI2021

Universal dwell time optimization for deterministic optics fabrication

Computer-Controlled Optical Surfacing (CCOS) has been greatly developed and widely used for precision optical fabrication in the past three decades. It relies on robust dwell time solutions to determine how long the polishing tools must dwell at certain points over the surfaces to achieve the expected forms. However, as dwell time calculations are modeled as ill-posed deconvolution, it is always non-trivial to reach a reliable solution that 1) is non-negative, since CCOS systems are not capable of adding materials, 2) minimizes the residual in the clear aperture 3) minimizes the total dwell time to guarantee the stability and efficiency of CCOS processes, 4) can be flexibly adapted to different tool paths, 5) the parameter tuning of the algorithm is simple, and 6) the computational cost is reasonable. In this study, we propose a novel Universal Dwell time Optimization (UDO) model that universally satisfies these criteria. First, the matrix-based discretization of the convolutional polishing model is employed so that dwell time can be flexibly calculated for arbitrary dwell points. Second, UDO simplifies the inverse deconvolution as a forward scalar optimization for the first time, which drastically increases the solution stability and the computational efficiency. Finally, the dwell time solution is improved by a robust iterative refinement and a total dwell time reduction scheme. The superiority and general applicability of the proposed algorithm are verified on the simulations of different CCOS processes. A real application of UDO in improving a synchrotron X-ray mirror using Ion Beam Figuring (IBF) is then demonstrated. The simulation indicates that the estimated residual in the 92.3 mm × 15.7 mm CA can be reduced from 6.32 nm Root Mean Square (RMS) to 0.20 nm RMS in 3.37 min. After one IBF process, the measured residual in the CA converges to 0.19 nm RMS, which coincides with the simulation.

36 MATERIALS SCIENCE↗
DOE OSTI2024

E-PVT: enhanced position-velocity-time scheduler for computer-controlled optical finishing with comprehensive considerations of dynamics constraints, continuity and efficiency

Deterministic computer-controlled optical finishing is an essential approach for achieving high-quality optical surfaces. Its determinism and convergence rely heavily on precise and smooth motion control to guide the machine tool over an optical surface to correct residual errors. One widely supported and smooth motion control model is position-velocity-time (PVT), which employs piecewise cubic polynomials to describe positions. Our prior research introduced a PVT-based velocity scheduling method, demonstrating sub-nanometer level convergence in ion beam figuring (IBF) processes. However, three challenges remained. Firstly, this method relies on quadratic programming, resulting in computational intensiveness for dense tool paths. Secondly, the dynamics constraints and velocity and acceleration continuities are not comprehensively considered, limiting the full potential of PVT-based control. Thirdly, no compensation mechanism existed when dynamics constraints are exceeded. In this study, in response to these challenges, we proposed the Enhanced PVT (E-PVT) method, reducing the time complexity from O ( n 3 ) to O ( n ) while fully addressing dynamics constraints and continuities. A novel compensation method utilizing particle swarm optimization was proposed to address situations where dynamics constraints might be exceeded while maintaining the overall processing efficiency. Validation through simulation and experimentation confirmed the improved performance of E-PVT.

36 MATERIALS SCIENCE↗
NASA NTRS2017

Keck Segment Surface Artifacts: Impacts on Segment Phasing and Image Quality

We show that the segments of the Keck telescopes su er from small but signi cant surface artifacts that limit segment phasing accuracy. Both the segment surface artifacts themselves and the limits they place on segment phasing have important implications for adaptive optics, high contrast imaging, and seeing limited observations. These surface artifacts are likely by-products of the segment polishing, most likely the Ion Beam Figuring (IBF) process that constitutes the nal step of the segment surface guring. The surface artifacts di ract a signi cant amount of light out past 3.5 arcseconds and generate chromatic e ects that limit segment phasing accuracy. We present on-sky measurements of the di racted intensity. Segment surface roughness measurements are also presented, which show that surface roughness is not the source of the problem. These results have direct relevance to segment manufacturing for the Thirty Meter Telescope (TMT) and other segmented mirror telescopes.

Brock, Neal↗
NASA NTRS2018

Interferometric Characterization of Keck Segment Edge Errors

The Keck telescope segments were manufactured by stressed mirror polishing of large circular pieces of Zerodur that were then cut into hexagons and finished by Ion Beam Figuring (IBF). It has long been believed that this process results in segments with little or no edge effects. As a result, this same general approach is planned for segment manufacturing for the Thirty Meter Telescope (TMT) and the European Extremely Large Telescope (E-ELT). However, recent measurements at the Keck telescope suggest that at least some of the Keck segments have significant aberrations within 60 mm of the edge. These aberrations impact the telescope phasing and the overall telescope image quality. We present interferometric measurements of multiple Keck segments, characterizing the surface errors near the edges over spatial periods from 5 cm down to 1 mm. We show that the largest phasing and image quality effects are due to plateaus of unremoved material, left behind after IBF as a result of obscuration by the IBF supports. Apart from these plateaus, the edge quality is relatively good, though not as good as in the segment interiors. Some residual phasing and image quality effects remain, and these are not currently understood.

Martinek, Stephen J.↗
NASA NTRS1996

Investigation of ion-beam machining methods for replicated x-ray optics

The final figuring step in the fabrication of an optical component involves imparting a specified contour onto the surface. This can be expensive and time consuming step. The recent development of ion beam figuring provides a method for performing the figuring process with advantages over standard mechanical methods. Ion figuring has proven effective in figuring large optical components. The process of ion beam figuring removes material by transferring kinetic energy from impinging neutral particles. The process utilizes a Kaufman type ion source, where a plasma is generated in a discharge chamber by controlled electric potentials. Charged grids extract and accelerate ions from the chamber. The accelerated ions form a directional beam. A neutralizer outside the accelerator grids supplies electrons to the positive ion beam. It is necessary to neutralize the beam to prevent charging workpieces and to avoid bending the beam with extraneous electro-magnetic fields. When the directed beam strikes the workpiece, material sputters in a predicable manner. The amount and distribution of material sputtered is a function of the energy of the beam, material of the component, distance from the workpiece, and angle of incidence of the beam. The figuring method described here assumes a constant beam removal, so that the process can be represented by a convolution operation. A fixed beam energy maintains a constant sputtering rate. This temporally and spatially stable beam is held perpendicular to the workpiece at a fixed distance. For non-constant removal, corrections would be required to model the process as a convolution operation. Specific figures (contours) are achieved by rastering the beam over the workpiece at varying velocities. A unique deconvolution is performed, using series-derivative solution developed for the system, to determine these velocities.

Drueding, Thomas W.↗
NASA NTRS2005

Making AlN(x) Tunnel Barriers Using a Low-Energy Nitrogen-Ion Beam

A technique based on accelerating positive nitrogen ions onto an aluminum layer has been demonstrated to be effective in forming thin (<2 nm thick) layers of aluminum nitride (AlN(x)) for use as tunnel barriers in Nb/Al-AlN(x)/Nb superconductor/insulator/ superconductor (SIS) Josephson junctions. AlN(x) is the present material of choice for tunnel barriers because, to a degree greater than that of any other suitable material, it offers the required combination of low leakage current at high current density and greater thermal stability. While ultra-thin AlN films with good thickness and stoichiometry control are easily formed using techniques such as reactive molecular beam epitaxy and chemical vapor deposition, growth temperatures of 900 C are necessary for the dissociative adsorption of nitrogen from either nitrogen (N2) or ammonia (NH3). These growth temperatures are prohibitively high for the formation of tunnel barriers on Nb films because interfacial reactions at temperatures as low as 200 to 300 C degrade device properties. Heretofore, deposition by reactive sputtering and nitridation of thin Al layers with DC and RF nitrogen plasmas have been successfully used to form AlN barriers in SIS junctions. However, precise control over critical current density Jc has proven to be a challenge, as is attaining adequate process reproducibility from system to system. The present ion-beam technique is an alternative to the plasma or reactive sputtering techniques as it provides a highly controlled arrival of reactive species, independent of the electrical conditions of the substrate or vacuum chamber. Independent and accurate control of parameters such as ion energy, flux, species, and direction promises more precise control of film characteristics such as stoichiometry and thickness than is the case with typical plasma processes. In particular, the background pressure during ion-beam nitride growth is 2 or 3 orders of magnitude lower, minimizing the formation of compounds with contaminants, which is critical in devices the performance of which is dictated by interfacial characteristics. In addition, the flux of incoming species can be measured in situ using ion probes so that the dose can be controlled accurately. The apparatus used in the present ion-beam technique includes a vacuum chamber containing a commercial collimated- ion-beam source, a supply of nitrogen and argon, and an ion probe for measuring the ion dose. Either argon or nitrogen can be used as the feed gases for the ion source, depending on whether cleaning of the substrate or growth of the nitride, respectively, is desired. Once the Nb base electrode and Al proximity layer have been deposited, the N2 gas line to the ion beam is vented and purged, and the ion-source is turned on until a stable discharge is obtained. The substrate is moved over the ion-beam source to expose the Al surface layer to the ion beam (see figure) for a specified duration for the formation of the nitride tunnel barrier. Next, the Nb counter-electrode layer is deposited on the nitride surface layer. The Nb/Al- AlN(x)/Nb-trilayer-covered substrate is then patterned into individual devices by use of conventional integrated-circuit processing techniques.

Kaul, Anupama↗