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At least 19 records

In situ sputter cleaning of thin film metal substrates for UHV-TEM corrosion studies.

A prerequisite for conducting valid corrosion experiments by in situ electron microscopy techniques is not only the achievement of UHV background pressure conditions at the site of the specimen but also the ability to clean the surface of the thin metal substrate specimen before initiation of the corrosive interaction. A miniaturized simple ion gun has been constructed for this purpose. The gun is small enough to be incorporated into an UHV electron microscope specimen chamber with hot stage in such a way as to permit bombardment of the substrate specimen while observing it by transmission electron microscopy TEM. It is shown that the ion beam generated is confined well enough to cause a sputtering removal of substrate material at a rate of approximately 5-10 A/min and to prevent the sputter deposition of contaminating material from the specimen holder.

Heinemann, K.↗

Model studies in catalysis with uhv-deposited metal particles and clusters

Small supported metal particles have become a popular area of intense research interest, and important contributions to the considered problems are being made from the fields of uhv technology, thin film physics surface science, and surface and thin film instrumentation. Attention is given to insulating supports, particulate metal deposits and their properties, metal/support interactions and gas exposures, and integrated experimental approaches. It is concluded that major contributions to the field of model catalysis should be forthcoming in the near future from uhv-based methods of research. Catalysis and catalysis-related problem areas expected to benefit from advanced model studies include catalyst preparation processing, sintering mechanisms for metals and alloys, separation of initial and final state effects for supported clusters, and the influence of particle and/or support morphologies.

Poppa, H.↗

Nuclei growth kinetics during the nucleation of gold on UHV-cleaved mica substrates

Measurements of crystalline sizes during nucleation of gold on mica surfaces cleaved in ultra-high vacuum (UHV) reveal the presence of symmetric, sharply peaked distributions which flatten and broaden with increasing nucleation time. When the number density of nuclei increases, the growth rate is suppressed. The time taken to reach a given size increases with increasing temperature when the nuclei are growing as isolated particles. When the nuclei are spaced so far that their diffusion fields overlap, then the time taken to reach a given size decreases with increasing temperature.

Elliot, A. G.↗

Bakeable UHV gate valve for microwave tube experimentation

The performance characteristics and design of an ultrahigh-vacuum (UHV) gate valve intended for experiments on high-power microwave tubes are described. Tests run on the valve indicate open/close cycles can run into the hundreds or thousands without trouble. The valve was baked at 450 C or higher for at least 4 h. Applications of the valve include evaluation of NASA-design multistage depressed collectors for high-power PPM focused helix-type traveling-wave tubes.

Gilmour, A. S., Jr.↗

UHV studies of the interaction of CO with small supported metal particles, Ni/mica

The interaction of carbon monoxide with small nickel (Ni) particles supported on UHV-cleaved mica was studied using flash thermal desorption, Auger electron spectroscopy, and transmission electron microscopy. Molecular desorption was accompanied by decomposition of CO at a rate strongly dependent on particle size. Recombination of surface-precipitated carbon with adsorbed oxygen was observed, and gas-induced morphological particle changes because of exposure to CO and O2 are analyzed in some detail.

Doering, D. L.↗

UHV studies of the interaction of CO with small supported metal particles, Pd/mica

The interaction of carbon monoxide with small palladium particles supported on UHV-cleaved and heat-treated single-crystal mica was studied. The Pd particles were characterized and tested using the techniques of flash thermal desorption, Auger electron spectroscopy, core electron energy loss spectroscopy, and transmission electron microscopy. Evidence is presented for CO decomposition on Pd particles during CO adsorption-desorption experiments. The rate of CO decomposition increased rapidly with diminishing particle size. Residual carbon from CO decomposition blocked CO adsorption and had a strong poisoning effect on the CO oxidation reaction.

Doering, D. L.↗

Small UHV compatible hyperthermal oxygen atom generator

A high purity, hyperthermal, continuous beam atomic oxygen source capable of retrofitting to existing UHV systems has been developed. The instrument complements a general system capability, while its small size and simplicity of design permits tailoring the instrument for most experimental geometries. The flux level presently available is near 1 x 10 (exp 14) cm(exp -2)s(exp -1)(3P) but may be extended toward the theoretical limit of 3x10(exp 15 cm(exp -2)s(exp -1). The energy distribution of the emitted neutrals shows that the mean kinetic energy is about the same as observed for the ions or about 4 eV. The energy of the oxygen atoms may be substantially reduced for other applications by collision with a temperature controlled, non-reactive surface (with a concomitant spread in the energy distribution).

Outlaw, Ronald A.↗

A versatile substrate design for LEED and AES studies in uhv.

A substrate design is described that incorporates a single crystal disk into an electrically isolated, electron bombardment heated mount. Electron and photon leakage from the bombarding filament are prevented, and LEED and AES may be used at elevated temperatures. A cold finger, thermally coupled to the mount, decreases the time lost between cleaning the crystal and cooling it to the desired observation temperature. The cold finger also allows observation at temperatures below ambient.

Holloway, P. H.↗

UHV outgassing measurements on various carbons.

Mass spectral analyses were made of gases desorbed from carbon samples at increasing temperatures up to 2200 K. Samples were initially outgassed above 2000 K, exposed to air for several hours at room temperature, and then tested in ultrahigh vacuum following a 24-hr bake at 300 C. Four forms of carbon tested were pyrolytic carbon, Grafoil, vitreous carbon, and pyrolyzed-phenolic fibers. The equivalent of several monolayers of gas (mostly H2 and CO) are evolved from all of the carbons except vitreous carbon. Less than a monolayer of gas is evolved from vitreous carbon during outgassing to 2000 K.

Beitel, G. A.↗

Outgassing measurement of the aluminum alloy UHV chamber

A large vacuum chamber (580 mm diameter) was fabricated from an aluminum alloy surface treated by a special process normally used on small chambers. The chamber was tested unbaked and baked at various temperatures, pressures, and holding periods. The chamber was filled with N2 gas, and the outgassing rate was measured after one hour. Then the ultimate pressure was measured. Outgassing rates for baked and unbaked groups were compared. It is concluded that the same surface treatment technique can be used on both large and small chambers produced by the same special extrusion process.

Miyamoto, M.↗

Flow Characteristics of UHV Nitrogen Arcjet

Flow characteristics in the nozzle of a nitrogen arcjet have been simulated by a model. Electrons, ions, and neutral atoms and molecules are represented as separate species. Dissociation, ionization, and recombination are treated as separate reactions. Thermal non-equilibrium is represented by a two-temperature model. Energy input to plasma from the arc is modeled as a source determined by local current and electrical conductivity. Momentum and energy losses and recombinations at the nozzle wall are included as source/sink determined by fluxes to the wall. The results show essentially frozen gas-phase reactions and thermal nonequilibrium due to Joule heating of electrons and in the expansion part of the nozzle. Wall interactions have strong effects on the results, indicating that they play important roles in the flow due to very high surface area relative to the volume of the plasma. For example, plasma velocity decreases from 6000 m per s without wall interactions to 3000 m per s with modest amount of wall interactions. These results also show reasonable agreement with optical emission measurements, which confirms that the arcjet plasma is far from LTE. The spectra suggest nitrogen dissociation levels of 0.3% - 9%, depending on nitrogen flow rate and arc plasma current, which also determine the relative amounts of excited atomic and molecular nitrogen. Langmuir probe studies of the source show that electron and ion fluxes increase with increasing power, and that the ion energy distribution shifts to lower energies. Typical ion fluxes were on the order of 4E-9 A/cm**2 with a maximum ion kinetic energy of 3.5eV. The median electron energy was 1eV, with a maximum of less than 4eV.

Chang, C. H.↗

The Nickel(111)/Alkaline Electrolyte Interface

The electrochemical properties of Ni (111) prepared and characterized in ultra high vacuum, UHV, by surface analytical techniques have been examined in alkaline media by cyclic voltammetry using an UHV-electrochemical cell transfer system designed and built in this laboratory. Prior to the transfer, the Ni(111) surfaces were exposed to saturation coverages of CO in UHV in an attempt to protect the surface from possible contamination with other gases during the transfer. Temperature Programmed Desorption, TPD, of CO-dosed Ni (111) surfaces displaying sharp c(4x2), LEED patterns, subsequently exposed to water-saturated Ar at atmospheric pressure in an auxiliary UHV compatible chamber and finally transferred back to the main UHV chamber, yielded CO2 and water as the only detectable products. This indicates that the CO-dosed surfaces react with water and/or bicarbonate and hydroxide as the most likely products. Based on the integration of the TPD peaks, the combined amounts of H2O and CO2 were found to be on the order of a single monolayer. The reacted c(4x2)CO/Ni(111) layer seems to protect the surface from undergoing spontaneous oxidation in strongly alkaline solutions. This was evidenced by the fact that the open circuit potential observed immediately after contact with deaerated 0.1 M KOH was about 0.38 V vs. DHE, drifting slightly towards more negative values prior to initiating the voltametric scans. The average ratio of the integrated charge obtained in the first positive linear scan in the range of 0.35 to 1.5 V vs. DHE (initiated at the open circuit potential) and the first (and subsequent) linear negative scans in the same solution yielded for various independent runs a value of 3.5 +/- 0.3. Coulometric analysis of the cyclic voltammetry curves indicate that the electrochemically formed oxyhydroxide layer involves a charge equivalent to 3.2 +/- 0.4 layers of Ni metal.

Wang, Kuilong↗

Method for producing an atomic oxygen beam

A method for producing an atomic oxygen beam is provided by the present invention. First, a material 10' is provided which dissociates molecular oxygen and dissolves atomic oxygen into its bulk. Next, molecular oxygen is exposed to entrance surface 11' of material 10'. Next, material 10' is heated by heater 17' to facilitate the permeation of atomic oxygen through material 10' to the UHV side 12'. UHV side 12' is interfaced with an ultra-high vacuum (UHV) environment provided by UHV pump 15'. The atomic oxygen on the UHV side 12' is excited to a non-binding state by exciter 14' thus producing the release of atomic oxygen to form an atomic oxygen beam 35'.

Outlaw, Ronald A.↗

Scanning Tunneling Microscopy Studies of Diamond Films and Optoelectronic Materials

We present a summary of the research, citations of publications resulting from the research and abstracts of such publications. We have made no inventions in the performance of the work in this project. The main goals of the project were to set up a Chemical Vapor Deposition (CVD) diamond growth system attached to an UltraHigh Vacuum (UHV) atomic resolution Scanning Tunneling Microscopy (STM) system and carry out experiments aimed at studying the properties and growth of diamond films using atomic resolution UHV STM. We successfully achieved these goals. We observed, for the first time, the atomic structure of the surface of CVD grown epitaxial diamond (100) films using UHV STM. We studied the effects of atomic hydrogen on the CVD diamond growth process. We studied the electronic properties of the diamond (100) (2x1) surface, and the effect of alkali metal adsorbates such as Cs on the work function of this surface using UHV STM spectroscopy techniques. We also studied, using STM, new electronic materials such as carbon nanotubes and gold nanostructures. This work resulted in four publications in refereed scientific journals and five publications in refereed conference proceedings.

Perez, Jose M.↗