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12 records

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DOE OSTI2025

Mitigating humidity interference in chemiresistive hydrogen sensors through hydrophobic surface functionalization

Chemiresistive gas sensors based on semiconductor metal oxides, such as tin dioxide (SnO₂), are indispensable for detecting and monitoring toxic gases and pollutants, making them critical components in industrial and environmental applications. To enhance their performance, the metal oxides are loaded with noble metals such as palladium (Pd). However, ambient humidity poses a significant challenge to their performance. The presence of adsorbed water molecules on the oxide surface can considerably impair sensor sensitivity and overall performance. To address this issue, in this paper, we report on the application of an ultrathin, hydrophobic layer of hexamethyldisilazane to the surface of a Pd/SnO 2 sensor. This study investigates the influence of hydrophobic surface modifications on the metal oxide interface, focusing on their impact on sensor sensitivity and selectivity. The resulting sensor exhibits superior hydrogen sensing capabilities, operating effectively at low temperatures even in high humidity environments. Furthermore, the hydrophobic modification reduces the sensor’s susceptibility to interfering gases, thus enhancing its selectivity. The combined enhancements in moisture resistance and selectivity achieved through HMDS surface modification, along with the superior sensitivity of Pd/SnO₂ sensors, facilitate the development of gas sensors with enhanced humidity tolerance and broader applications.

Chemiresistive gas sensors↗

DOE OSTI2023

Self-Assembled Monolayer Procedure to Pattern Silicon Passivated Contacts

We utilize hexamethyldisilazane (HMDS)-based self-assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching frontside n/polySi between fingers, thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.

hexamethyldisilazane↗

DOE OSTI2025

Self‐Assembled Monolayer Templating for Engineered Nanopinholes in Passivated Contact Solar Cells

We present a novel self-assembled monolayer (SAM)-based technique to make nanopinhole-enabled passivated contacts on silicon solar cells by tuning the SAM coverage area and etch selectivity. We deposit trimethyl-silyl Si(CH 3 ) 3 groups using hexamethyldisilazane (HMDS) as the precursor over passivating dielectric layers and their stacks (SiO 2 , SiN x , SiO 2 /SiN x ) and interrupt the HMDS attachment chemistry shortly before a full monolayer is formed on its surface. Subsequent etching in dilute HF produces pinholes through the dielectric layers due to the higher etch resistance of the SAM to HF etching. The pinhole areal density (10 4 –10 8 /cm 2 ) and size (10–1000 nm) can be tuned both by duration of HMDS attachment and HF etch time. Pinholes were characterized by atomic force microscopy, tetramethylammonium hydroxide (TMAH) selective etch, and Ag decoration by electroless plating. Polysilicon (poly-Si) passivated contacts enabled by pinholes were formed by subsequent deposition of doped amorphous silicon (a-Si:H) followed by thermal crystallization and dopant drive-in. At optimal areal pinhole density ≈10 7 /cm 2 , contacts exhibit both passivation and carrier transport via pinholes as evidenced by electron beam induced current, transmission line measurements, and carrier lifetime measurements. Solar cells based with these pinhole contacts show V oc = 723 mV and FF = 80.3%. The remaining SAM layer does not affect device performance.

14 SOLAR ENERGY↗

DOE OSTI2025

Design and synthesis of biobased superhydrophobic biochar catalyst derived from Citrus sinensis for biodiesel production using inedible oil feedstocks

In an one-pot in situ trans/esterification of low-grade feedstocks, the simultaneous presence of triglycerides (TAGs) and free fatty acids (FFAs) presents a dual catalytic challenge. While TAGs undergo transesterification to form biodiesel and glycerol, FFAs present in the feedstocks are esterified simultaneously, producing water as a by-product. This water can deactivate acid catalysts by interacting with their active sites, reducing catalytic efficiency and reusability. To overcome this, we developed a hydrophobic sulfonic acid-functionalized biochar catalyst derived from Citrus sinensis (orange peel) via sulfonation with H 2 SO 4 and subsequent silylation using hexamethyldisilazane (HMDS). The optimized catalyst exhibited a high surface area (355.09 m 2 g −1 ), sulfur content (5.33 wt%), and strong hydrophobicity (water contact angle: 154°). Compared to non-hydrophobic analogs, it showed enhanced activity and reusability (up to 10 cycles). Using response surface methodology with central composite design, a biodiesel yield of 99.1 ± 0.4% was achieved under optimal conditions. Life cycle assessment was performed to evaluate the environmental impacts of biodiesel production utilising the synthesized catalyst, considering 1000 kg of biodiesel produced as 1 functional unit. In conclusion, the recorded results showed the cumulative abiotic depletion of fossil resources over the entire biodiesel production process as 87 243.423 MJ and global warming potential as 4103.494 kg CO 2 equivalent.

Biochar↗

DOE OSTI2023

Self Assembled Monolayers for Passivated Contacts

Passivated contacts mitigate defects typically encountered due metallization of solar cells. We deposit amorphous silicon (a-Si:H) on an oxidized silicon wafer via PECVD and anneal at high temperature to crystallize into polysilicon passivated contact. One drawback is the absorption of the polysilicon between grid fingers, so removal of this material is desirable to maximize Jsc. Alternatively, interdigitated back contact cells rely on a gap between n- and p- fingers, which is commonly etched to ensure electronic isolation. We utilize a self assembled monolayer (SAM) using hexamethyldisilazane (HMDS) as a precursor to pattern and etch amorphous silicon (a-Si:H) and polysilicon without the need for photoresist. Ultraviolet light exposure oxidizes the HMDS by photocleaving the organic groups [1] of the SAM leaving a patterned SiO2. Directly soaking this in TMAH will eventually etch the SAM and the silicon, where the SiO2 serves as an etch mask. Inversely, a dilute HF dip selectively etches this SiO2 and the SAM remains. A subsequent soak in TMAH selectively etches the underlying silicon, where the SAM serves as an etch mask. Importantly, we find that the SAM can remain intact for metallization, where we measure 10 mO-cm2 specific contact resistivity on n-type polysilicon.

passivation↗

DOE OSTI2023

Self-Assembled Monolayer Patterning for PolySi/SiO2 Passivated Contacts

We utilize hexamethyldisilazane (HMDS) based self assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching front side n/polySi between fingers; thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.

degradation↗

DOE OSTI2025

Defect passivation in nanostructured silica for stable birefringence in polarization optics

Nanostructured materials with anisotropic microstructure exhibit direction-dependent refractive index, known as form birefringence. One of the main advantages of these nanostructured materials is that the ease of fabrication significantly reduces the cost of production. However, their birefringence is affected by humidity as well as time. The hypothesis is that defects, particularly silanols, are responsible. Here, in this work, we present the use of hexamethyldisilazane (HMDS) vapor as a passivation strategy. Using spectroscopic ellipsometry and Raman scattering, the data show that HMDS successfully passivates silanol groups and promotes O-Si-O bond formation, resulting in improved stability. The results demonstrate a simple method to enhance the reliability of all-silica polarization optics offering potential advancements for high-power laser components.

Mireles, Marcela [Univ. of Rochester, NY (United S↗

NASA NTRS1982

Chemical modification of TiO2 surfaces with methylsilanes and characterization by infrared absorption spectroscopy

Infrared absorption spectra of methylsilanes bonded to a TiO2 powder were obtained. The reacting silanes include Me sub (4-n)SiX sub n (n=1-4; X=Cl, OMe) and hexamethyldisilazane (HMDS). Reactions were performed on hydroxylated-but-anhydrous TiO2 surfaces in the gas phase. IR spectra confirm the presence of a bonded silane layer. Terminal surface OH groups are found to react more readily than bridging OH groups. By-products of the modification adsorp tenaciously to the surface. The various silanes show only small differences in their ability to sequester surface OH groups. Following hydrolysis in moist air, Si-OH groups are observed only for the tetrafunctional silanes.

Finklea, H. O.↗

NASA NTRS1985

Waterproofing Agents for Silica Tiles

Waterproofing agent methyltrimethoxysilane applied to silica thermal insulation tiles in simple vapor-deposition process. Other waterproofing agents in same series include methylsiloxane and hexamethyldisilazane. Originally developed for insulating tiles for spacecraft, agents also find uses in roofing tiles, insulation for buildings or solar-energy systems, or solar reflectors.

Nakano, H. N.↗

NASA NTRS1990

Rewaterproofing Chemical For Use With Silicones

Agent restores impermeability without degrading silicone adhesives and substructures. Dimethylethoxysilane (DMES) found to rewaterproof tiles and composite panels internally without harming materials that underlie them. Replaces hexamethyldisilazane (HMDS) as postmission rewaterproofing agent for tiles of thermal-protection system on Space Shuttle. Much of original waterproofing lost during rigors of launch and reentry. Potential terrestrial application includes composite materials in such structures as bridges and submarines.

Hill, William L.↗

NASA NTRS1992

Silazane to silica

Thin film silica and/or methyl silicone were detected on most external surfaces of the retrieved LDEF. Known sources of silicone in or on the LDEF appear inadequate to explain the ubiquitous presence of the silica and silicone films. Hexamethyldisilazane (HMDS) was used as the Challenger tile waterproofing compound for the Challenger/LDEF deployment mission. HMDS releases NH3 which depolymerizes silicone RTV's. Polyurethanes were also attacked. Much of the silica/silicone contamination of LDEF resulted from HMDS.

Harvey, Gale A.↗

NASA NTRS1993

Silazine to silica

Thin film silica and/or methyl silicone were detected on most external surfaces of the retrieved LDEF. Both solar ultraviolet radiation and atomic oxygen can convert silicones to silica. Known sources of silicone in or on the LDEF appear inadequate to explain the ubiquitous presence of the silica and silicone films. Hexamethyldisilazane (HMDS) was used as the Challenger tile waterproofing compound for the Challenger/LDEF deployment mission. HMDS is both volatile and chemically reactive at STP. In addition, HMDS releases NH3 which depolymerizes silicone RTV's. Polyurethanes are also depolymerized. Experiments are reported that indicate much of the silicone and silica contamination of LDEF resulted directly or indirectly from HMDS.

Harvey, Gale A.↗