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NASA's Surface Metrology is presented in viewgraph form. The topics include: 1) Facilities/Major Equipment; 2) Taylor Hobson NanoStep II; 3) Topometrix; and 4) Surface Metrology Applications.
The Third Seminar on Surface Metrology for the Americas (SSMA) took place in Albuquerque, New Mexico May 12-13, 2014. The conference was at the Marriott Hotel, in the heart of Albuquerque Uptown, within walking distance of many fantastic restaurants. Why surface metrology? Ask Professor Chris Brown of Worcester Polytechnic Institute (WPI), the chair of the first two SSMAs in 2011 and 2012 and the chair of the ASME B46 committee on classification and designation of surface qualities, and Professor Brown responds: “Because surfaces cover everything.”
The surface finishing of X ray grazing incidence optics is a most demanding area of optical processing, both in terms of metrology and application of optical finishing techniques. An existing optical mirror was processed using a new removal technique that uses a jet of finely dispersed and extremely small particles that impact a surface, which under the correct conditions, produces an ultrasmooth surface, especially on aspheric curvatures. The surfaces of the SO56 mirror are tapered conical shapes that have a continuously changing radius with the primary mirror having a parabolic shape and the secondary mirror a hyperbolic shape. An optical ray trace that was conducted of a telescope used the measured parameters from the existing substrates to set up the prescription for the optical layout. The optimization indicated a wavefront performance of 0.10 A at 0.633 micron.
The design and evaluation of the expected performance of optical systems require sophisticated and reliable information about the surface topography for planned optical elements before they are fabricated. Modern x-ray source facilities are reliant upon the availability of optics with unprecedented quality (surface slope accuracy <0.1 μrad). The problem is especially complex in the case of x-ray optics, particularly for the X-ray Surveyor under development and other missions. The high angular resolution and throughput of future x-ray space observatories requires hundreds of square meters of high-quality optics. The uniqueness of the optics and limited number of proficient vendors makes the fabrication extremely time consuming and expensive, mostly due to the limitations in accuracy and measurement rate of metrology used in fabrication. Here, we discuss improvements in metrology efficacy via comprehensive statistical analysis of a compact volume of metrology data. The data are considered stochastic, and a statistical model called invertible time-invariant linear filter (InTILF) is developed now for two-dimensional (2-D) surface profiles to provide compact description of the 2-D data in addition to one-dimensional data treated so far. The InTILF model captures stochastic patterns in the data and can be used as a quality metric and feedback to polishing processes, avoiding high-resolution metrology measurements over the entire optical surface. The modeling, implemented in our BeatMark™ software, allows simulating metrology data for optics made by the same vendor and technology. The data are vital for reliable specification for optical fabrication, to be exactly adequate for the required system performance.
A multi-channel heterodyne laser interferometer is proposed for measurement of optical surface deformations at the sub-nanometer level.
A multi-channel heterodyne laser interferometer is proposed for the JPL Thermo-Opto-Mechanical Testbed, which requires the measurement of optical surface deformations at the sub-nanometer level.
In this paper the details of the design, construction and performance of these triplet of interferometers are presented.
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Very high resolution spatial interferometry requires picometer level one-dimensional metrology, surface metrology, and 3-dimensional metrology. The absolute distance measurements with accuracies of only 1 part in a million are required due to the careful design of spacecraft like the proposed Stellar Interferometry Mission (SIM), carrying high resolution stellar interferometers. An absolute calibration system for the surface gauge described in a previous paper is demonstrated. A self-calibrating absolute metrology system with a repeatability of 2 microns rms over a one-way distance of a meter is demonstrated. The accuracy calibration of this gauge is in progress. An auto-aligning, 3-dimensional metrology gauge is constructed using the sub-picometer linear metrology gauge described in earlier papers. Initial test results from this demonstration are presented.
We present experimental, analytical, and numerical methods developed for reconstruction (deconvolution) of one-dimensional (1D) surface slope profiles over the spatial frequency range where the raw data are significantly perturbed due to the limited resolution of the measurement instrument. We characterize the spatial resolution properties of a profiler with the instrument's transfer function (ITF). To precisely measure the ITF, we apply a recently developed method utilizing test surfaces with 1D linear chirped height profiles of constant slope amplitude. Based on the results of the ITF calibration, we determine parameters of an analytical model for the ITF that is used in the original reconstruction software. Here, we treat surface slope metrology data obtained with the Optical Surface Measuring System (OSMS), using as a sensor an electronic autocollimator (AC) ELCOMAT-3000. The spatial resolution of the OSMS is limited by the size of the AC light-beam-collimating aperture. For the purposes of this investigation, the OSMS is equipped with a circular aperture with a diameter of 2.5 mm. This is a typical arrangement of most AC-based slope profilers developed for surface slope metrology of state-of-the-art x-ray mirrors. Using the example of surface slope metrology of two state-of-the-art elliptically shaped x-ray focusing mirrors, we demonstrate that the developed data reconstruction procedure allows us to significantly improve the accuracy of surface slope metrology with the OSMS over the spatial wavelength range from ~1.6 mm to 7 mm. Thus, the amplitude of the quasi-periodic error characteristic of the deterministic polishing process used appears to be higher by a factor of~2 than is apparent from the rough metrology data. Underestimation of the surface slope errors in this spatial wavelength range can lead to serious errors in the expected performance of x-ray mirrors in synchrotron beamlines, especially at modern light sources utilizing coherent x rays, where the perturbations can lead to increased speckle-like intensity variation.
Surface topography and surface finish are two significant factors for evaluating the quality of products in additive manufacturing (AM). AM parts are fabricated layer by layer, which is quite different from traditional formative or subtractive methods. Despite rapid progress in additive manufacturing and associated optical metrology for quality control and in-situ monitoring, limited research has been conducted to investigate the reliability of 3D surface measurement data. The surface topologies scanned by multiple optical systems demonstrated significant differences due to varying sampling mechanisms, resolutions, system noises, etc. The 3D datasets should be trustworthy in order to extract parameters for quality assurance or feedback control from 3D surface measurements. In this paper, we set up new standards to evaluate the reliability of 3D surface measurement data and analyze the variation in the topographical profile. In this study, two non-contact optical methods based on Focus Variation Microscopy (FVM) and Structured Light System (SLS) were adopted to measure the surface topography of the target components. The two optical metrology systems generated two entirely different point cloud datasets. Statistical methods were applied to test the difference between the data obtained from the two systems. By using a data analytics approach for comparison, it was found that the surface roughness estimated from the point cloud data sets of FVM and SLS has no significant difference, though the point cloud data sets were completely different. This paper provides standard validation approach to evaluate the plausibility of metrology data from in-situ real-time surface analysis for process planning of AM.
Marshall Space Flight Center is developing the method of direct fabrication for high resolution full-shell x-ray optics. In this technique the x-ray optics axial profiles are figured and polished using a computer-controlled ZeekoIRP600X polishing machine. Based on the Chandra optics fabrication history about one third of the manufacturing time is spent on moving a mirror between fabrication and metrology sites, reinstallation and alignment with either the metrology or fabrication instruments. Also, the accuracy of the alignment significantly affects the ultimate accuracy of the resulting mirrors. In order to achieve higher convergence rate it is highly desirable to have a metrology technique capable of in situ surface figure measurements of the optics under fabrication, so the overall fabrication costs would be greatly reduced while removing the surface errors due to the re-alignment necessary after each metrology cycle during the fabrication. The goal of this feasibility study is to demonstrate if the Phase Measuring Deflectometry can be applied for in situ metrology of full shell x-ray optics. Examples of the full-shell mirror substrates suitable for the direct fabrication
We describe the Metrology Data Processor (METDAT), the Optical Surface Analysis Code (OSAC), and their application to the image evaluation of the Far Ultraviolet Spectroscopic Explorer (FUSE) mirrors. The FUSE instrument - designed and developed by the Johns Hopkins University and launched in June 1999 is an astrophysics satellite which provides high resolution spectra (lambda/Delta(lambda) = 20,000 - 25,000) in the wavelength region from 90.5 to 118.7 nm The FUSE instrument is comprised of four co-aligned, normal incidence, off-axis parabolic mirrors, four Rowland circle spectrograph channels with holographic gratings, and delay line microchannel plate detectors. The OSAC code provides a comprehensive analysis of optical system performance, including the effects of optical surface misalignments, low spatial frequency deformations described by discrete polynomial terms, mid- and high-spatial frequency deformations (surface roughness), and diffraction due to the finite size of the aperture. Both normal incidence (traditionally infrared, visible, and near ultraviolet mirror systems) and grazing incidence (x-ray mirror systems) systems can be analyzed. The code also properly accounts for reflectance losses on the mirror surfaces. Low frequency surface errors are described in OSAC by using Zernike polynomials for normal incidence mirrors and Legendre-Fourier polynomials for grazing incidence mirrors. The scatter analysis of the mirror is based on scalar scatter theory. The program accepts simple autocovariance (ACV) function models or power spectral density (PSD) models derived from mirror surface metrology data as input to the scatter calculation. The end product of the program is a user-defined pixel array containing the system Point Spread Function (PSF). The METDAT routine is used in conjunction with the OSAC program. This code reads in laboratory metrology data in a normalized format. The code then fits the data using Zernike polynomials for normal incidence systems or Legendre-Fourier polynomials for grazing incidence systems. It removes low order terms from the metrology data, calculates statistical ACV or PSD functions, and fits these data to OSAC models for the scatter analysis. In this paper we briefly describe the laboratory image testing of FUSE spare mirror performed in the near and vacuum ultraviolet at John Hopkins University and OSAC modeling of the test setup performed at NASA/GSFC. The test setup is a double-pass configuration consisting of a Hg discharge source, the FUSE off-axis parabolic mirror under test, an autocollimating flat mirror, and a tomographic imaging detector. Two additional, small fold flats are used in the optical train to accommodate the light source and the detector. The modeling is based on Zernike fitting and PSD analysis of surface metrology data measured by both the mirror vendor (Tinsley) and JHU. The results of our models agree well with the laboratory imaging data, thus validating our theoretical model. Finally, we predict the imaging performance of FUSE mirrors in their flight configuration at far-ultraviolet wavelengths.
Ellipsoidal mirrors, which can efficiently produce a two-dimensional focusing beam with a single mirror, are superior x-ray focusing optics, especially when compared to elliptical-cylinder mirrors in the Kirkpatrick–Baez geometry. However, nano-focusing ellipsoidal mirrors are not commonly used for x-ray optics because achieving the accuracy required for the surface metrology of nano-focusing ellipsoidal mirrors is difficult due to their small radius of curvature along the short ellipsoidal axis. Here, we developed a surface metrology system for nano-focusing ellipsoidal mirrors using stitching interferometric techniques. The developed system simultaneously measures sub-aperture shapes with a microscopic interferometer and the tilt angles of the sub-aperture shapes with a large Fizeau interferometer. After correcting the systematic errors included in the sub-aperture shapes, the entire mirror shape is calculated by stitching the sub-aperture shapes based on the obtained relative angles between partially overlapped sub-apertures. In this study, we developed correction methods for systematic errors in sub-aperture shapes that originated from off-axis aberrations produced in the optics of the microscopic interferometer. The systematic errors on an ellipsoidal mirror were estimated by measuring a series of tilted plane substrates and the ellipsoidal substrate. From measurements of an ellipsoidal mirror with a 3.6-mm radius of curvature at the mirror center, we obtained a measurement repeatability of 0.51 nm (root-mean-square) in an assessment area of 0.5 mm × 99.18 mm. This value satisfies the requirements for surface metrology of nano-focusing x-ray mirrors. Thus, the developed metrology system should be applicable for fabricating nano-focusing ellipsoidal mirrors.