Analog diffractive optics on flat and non-flat substrates: electron-beam fabrication and applications
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Engineering topics
Publications and source records attributed to Maker, P..
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Laterally coupled distributed feedback lasers using high-density InAs quantum dots-in-a-well (DWELL) active region demonstrate a nominal wavelength of 1310 nm, a linewidth as small as 68 kHz, and a linewidth-power product of 100 kHz-mW.
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Diffractive optical elements fabricated on flat and non-flat substrates frequently act as dispersive elements in imaging spectrometers. We describe the design and electron-beam fabrication of blazed and computer-generated-hologram gratings for slit and tomographic imaging spectrometers.
Diffractive optical elements fabricated on flat and non-flat substrates frequently act as dispersive elements in imaging spectrometers. We describe the design and electron-beam fabrication of blazed and computer-generated-hologram gratings for slit and tomographic imaging spectrometer.
A multiple-write electron beam lithography techniques is described as linear filter on the grating spatial frequency spectrum.
Frequency selective surfaces are widely used in the microwave and millimeter wave regions of the spectrum for filtering signals.
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The continued need for increased bandwidth is driving the pursuit of both increased speed in TDM and more channels in WDM for fiber optic communication systems.
Multi-wavelength arrays of colliding pulse mode-locked (CPM) lasers have been demonstrated for wavelength division multiplexing (WDM) applications. The need for increased bandwidth is driving the development of both increased speed in time division multiplexing (TDM) and more channels in WDM for fiber optic communication systems.
High-performance blazed gratings have been fabricated on convex surfaces by electron beam lithography, for use in an instrument to be flown on NASA's NM-EO1 spacecraft.
We will discuss the application to astronomical instrumentation, theory of operation, the manufactureing technique, and its current limitations and possible means of improvement.
The current status of III-V tunable diode lasers (TDLs) emitting between 1-5 mue wavelengths for spectroscopy and chemical analysis is described.
Diffractive optical elements (microlenses) for quantum will infrared photodetectors (QWIPs) were fabricated by two techniques: 1) standard lithography of a binary optical structure and 2) PMMA pattern transfer for an analog diffractive optic structure.
A new technology for infrared optical filters is presented. We have produced a bandpass filter consisting of a thin Si wafer with cross-shaped metal patterns deposited on both sides.
Computer generated phase holograms have been fabricated by E-Beam lithography in PMMA using patterned exposure and subsequent partial development.