NASA NTRS · 19670030532
SiO2/Si interface states at 77 deg K
Abstract
Silicon oxide-silicon interface states at 77 degrees K
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Caban-Zeda, H. P., Greenstein, E., Kuper, A. B.. 1967-01-01. SiO2/Si interface states at 77 deg K. https://ntrs.nasa.gov/citations/19670030532
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