NASA NTRS · 19710004054
Development of ion implantation techniques for microelectronics
Abstract
Ion implantation forming of conducting layers and p-n junctions in gallium arsenide and silicon carbide
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Dunlap, H., Hart, R., Hunsperger, R. G., Marsh, O. J.. 1970-01-01. Development of ion implantation techniques for microelectronics. https://ntrs.nasa.gov/citations/19710004054
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