NASA NTRS · 19740000263
Low-temperture electrostatic silicon-to-silicon seals using sputtered borosilicate glass
Abstract
Silicon members are hermetically sealed to each other. Process produces no measurable deformation of silicon surfaces and is compatible with package designs of tight tolerance. Seals have been made with glass coatings in 10-mm to 20-mm thickness range without any prior annealing of coated silicon substrates.
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Hardesty, C. A., Brooks, A. D., Donovan, R. P.. 1975-01-01. Low-temperture electrostatic silicon-to-silicon seals using sputtered borosilicate glass. https://ntrs.nasa.gov/citations/19740000263
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