NASA NTRS · 19810000285
XPS Study of SiO2 and the Si/SiO2 Interface
Abstract
X-ray photoelectron spectroscopy (XPS) is analytical technique for understanding electronic structure of atoms close to surface in solids, in preference to bulk structure of material. Study found evidence for core-level chemical shifts arising from changes in local structural environment in amorphous SiO2 and at Si/SiO2 interface. Observed XPS spectra may be understood as sequential convolution of several functions, each with well-defined physical interpretation.
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Grunthaner, F. J., Grunthaner, P. J., Vasquez, R. P., Lewis, B. F., Maserjian, J., Madhukar, A.. 1982-12-01. XPS Study of SiO2 and the Si/SiO2 Interface. https://ntrs.nasa.gov/citations/19810000285
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