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NASA NTRS · 19860027699

Reflection high energy electron diffraction intensity behavior during homoepitaxial molecular beam epitaxy growth of GaAs and implications for growth kinetics and mechanisms

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Lewis, B. F., Grunthaner, F. J., Fernandez, R., Madhukar, A., Lee, T. C.. 1985-10-01. Reflection high energy electron diffraction intensity behavior during homoepitaxial molecular beam epitaxy growth of GaAs and implications for growth kinetics and mechanisms. https://ntrs.nasa.gov/citations/19860027699

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