NASA NTRS · 19860062637
Slow crack growth measurement using an electrical grid
Abstract
Photolithography was used to produce a resistance grid on the surface of a DCB fracture specimen. The grid line spacings were 10 microns over a distance of 2 cm. Slow crack growth was measured on soda-lime-silica glass. At low values of K(I) (0.3 to 0.4 MPa.sq r + m, increased. Equations are given for the design of grids. The grid technique could be used to measure very slow crack growth at high temperature with appropriate compatible metal-ceramic materials.
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Martin, D. J., Davido, K. W., Scott, W. D.. 1986-07-01. Slow crack growth measurement using an electrical grid. https://ntrs.nasa.gov/citations/19860062637
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