NASA NTRS · 19890000482
Making Submicron CoSi2 Structures On Silicon Substrates
Abstract
Experimetnal fabrication process makes submicron-sized structures of single-crystal metallic CoSi2 on silicon substrates. Amorphous Co:Si(1:2) crystallized by electron beam becoming single-crystal CoSi2. Remaining amorphous Co:Si then preferentially etched away. When fully developed, process used to make fine wires or dots exhibiting quantum confinement of charge carriers.
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Nieh, Simon K. W., Lin, True-Lon, Fathauer, Robert W.. 1989-09-01. Making Submicron CoSi2 Structures On Silicon Substrates. https://ntrs.nasa.gov/citations/19890000482
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