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NASA NTRS · 19910035877

Micromachined silicon tunnel sensor for motion detection

Abstract

The extreme sensitivity of electron tunneling to variations in electrode separation has been used to construct a novel, compact displacement transducer. Electrostatic forces are used to control the separation between the tunneling electrodes, thereby eliminating the need for piezoelectric actuators. The entire structure is composed of micromachined silicon single crystals, including a folded cantilever spring and a tip. Measurements of displacement sensitivity and noise are reported. This device offers a substantial improvement over conventional technology for applications which require compact, highly sensitive transducers.

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BibTeXRIS

Kenny, T. W., Waltman, S. B., Reynolds, J. K., Kaiser, W. J.. 1991-01-07. Micromachined silicon tunnel sensor for motion detection. https://ntrs.nasa.gov/citations/19910035877

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