Taguchi Optimization for the Processing of Epon SU-8 Resist

Eyre, B.; Blosiu, J.; Wiberg, D.

NASA NTRS · 20060035690

Taguchi Optimization for the Processing of Epon SU-8 Resist

Eyre, B.·Blosiu, J.·Wiberg, D.

View original source ↗Export metadata ↓

Abstract

The source did not provide an abstract. Follow the original record for more information.

Explore related subjects

adherence to substrate orthogonal arrays photoresist reveal output sensitivity space resolutinon

Keep this discovery

Explore connections, maps & timelines

BibTeX RIS

Eyre, B., Blosiu, J., Wiberg, D.. 1998-01-25. Taguchi Optimization for the Processing of Epon SU-8 Resist. https://ntrs.nasa.gov/citations/20060035690

Cite the original work for its findings. Save a collection to share your selection of sources.