NASA NTRS · 20060041053
Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit
Abstract
Optical masking lithography has been the primary tool of the semiconductor industry for transferring circuit images onto substrates to form semiconductor chips.
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Dowling, J., Boto, A., Abrams, D., Williams, C.. 1999-01-01. Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit. https://ntrs.nasa.gov/citations/20060041053
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