Metasurface-generated complex 3-dimensional optical fields for interference lithography

Abstract

Significance Fast submicrometer-scale 3D printing techniques are of interest for various applications ranging from photonics and electronics to tissue engineering. Interference lithography is a versatile 3D printing method with the ability to generate complicated nanoscale structures. Its application, however, has been hindered by either the complicated setups in multibeam lithography that cause sensitivity and impede scalability or the limited level of control over the fabricated structure achievable with mask-assisted processes. Here, we show that metasurface masks can generate complex volumetric intensity distributions with submicrometer scales for fast and scalable 3D printing. These results push the limits of optical devices in controlling the light intensity distribution and significantly increase the realm of possibilities for 3D printing.